光子学报, 2019, 48 (5): 0516001, 网络出版: 2019-06-12  

激光功率密度对相同曝光量下氧化石墨烯还原的影响

Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure
作者单位
重庆大学 光电工程学院 光电技术及系统教育部重点实验室, 重庆 400044
摘要
采用488 nm连续激光在相同曝光量条件下对氧化石墨烯样品进行光照还原实验, 并通过透射率和电阻率来表征还原氧化石墨烯的性质.结果表明:在还原过程中, 通过透过率和电阻率表征的还原程度呈现相同的变化趋势.此外, 还原过程分为两个步骤:达到相对稳定状态之前和达到相对稳定状态.在达到相对稳定状态之前, 激光功率密度越低, 样品的还原程度越高; 但当达到相对稳定的状态后, 激光功率密度越高, 样品的还原程度越高.基于rGO中含氧官能团的变化, 通过光子穿透能力和光对rGO的带隙调制作用对这一现象进行了分析.
Abstract
Light reduction experiments were carried out with a 488 nm continuous laser under the same exposure. Simultaneously the properties of reduced graphene oxide (rGO) were characterized by transmittance and resistivity. The results show that during the reduction process, the degree of reduction characterized by resistivity and transmittance presents the same trend. Moreover, the reduction process is divided into two steps: before reaching the relatively stable state and reaching the relatively stable state. Before reaching the relatively stable state, the lower the laser power density, the higher the reduction degree of the samples; but when reaching the relatively stable state, the higher laser power density, the higher the reduction degree of the samples. This phenomenon is further analyzed by means of photon penetration and bandgap modulation, based on the change of oxygenated functional groups in rGO.

谢磊, 雷小华, 谭小刚, 刘显明, 邓益俊, 陈伟民. 激光功率密度对相同曝光量下氧化石墨烯还原的影响[J]. 光子学报, 2019, 48(5): 0516001. XIE Lei, LEI Xiao-hua, TAN Xiao-gang, LIU Xian-ming, DENG Yi-jun, CHEN Wei-min. Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure[J]. ACTA PHOTONICA SINICA, 2019, 48(5): 0516001.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!