为了快速获取不平整度达数微米量级的光学表面面形分布，提出一种基于变倾角移相的斜入射动态干涉仪方案。基于迈克耳逊干涉仪主光路系统，采用2×2 点光源阵列，通过精确控制各点光源在干涉腔的入射倾角，引入等间隔移相，结合透镜阵列实现空间分光，在单个CCD 上同时采集四幅移相干涉图，实现动态测量。在68°斜入射角下测量了口径35 mm 硅片的平整度，均方根(RMS)值为1.631 μm，峰谷(PV)值为9.082 μm。实验结果表明，将变倾角同步移相技术引入斜入射干涉系统，可以克服环境震动的干扰，在保证高精度的前提下拓宽了可见光干涉仪的测量范围。

An oblique incidence dynamic phase-shifting interferometer based on inclination angle deflection is proposed to quickly obtain the surface distribution of optical surface with flatness of micron dimension. A 2×2 point source array is introduced into a Michelson interference system, and the incidence angle of each point source on the interferometer cavity is adjusted precisely to induce equal phase shift. Spatial separation is realized in combination with a lens array. The four phase-shifting interferograms are captured simultaneously on a single CCD, thereby realizing dynamic measurement. The flatness of a 35 mm aperture silicon wafer is measured at oblique incidence angle of 68°, the root mean square (RMS) is 1.631 μm and peak-to-valley (PV) is 9.082 μm. The experimental results indicate that the proposed interferometer overcomes the disturbance of vibration environment and extends the measurement range of interferometer with high precision by introducing the simultaneous phase-shifting interferometry based on inclination angle deflection into the oblique incidence interference system.