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超高精度面形干涉检测技术进展

The research progress of surface interferometric measurement with higher accuracy

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摘要

深紫外、极紫外光刻、先进光源等现代光学工程牵引驱动超精密光学技术持续发展, 超精密光学制造要求与之精度相匹配的超高精度检测技术。作为核心技术指标之一的面形精度通常要求达到纳米、深亚纳米甚至几十皮米量级, 超高精度面形干涉检测技术挑战技术极限, 具有重要研究意义和应用价值。本文分析了面形干涉检测技术发展趋势, 主要介绍了中国科学院光电技术研究所近年来在超高精度面形干涉检测技术相关研究进展。

Abstract

With the continuous development of modern optics, such as EUV, DUV lithography and the advanced light source, the surface interferometric measurement with higher accuracy has become an important challenge. The surface accuracy as one of key technical parameters will be required to nanometer, sub-nanometer, even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology, has important research significance and application value. This paper analyzes the development trends of surface interferometric measurement with higher accuracy and reports the related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences.

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中图分类号:TN247;TH741

DOI:10.12086/oee.2020.200209

所属栏目:综述

收稿日期:2020-06-05

修改稿日期:2020-07-07

网络出版日期:--

作者单位    点击查看

侯溪:中国科学院光电技术研究所, 四川 成都 610209
张帅:中国科学院光电技术研究所, 四川 成都 610209中国科学院大学, 北京 100049
胡小川:中国科学院光电技术研究所, 四川 成都 610209
全海洋:中国科学院光电技术研究所, 四川 成都 610209
吴高峰:中国科学院光电技术研究所, 四川 成都 610209
贾辛:中国科学院光电技术研究所, 四川 成都 610209
何一苇:中国科学院光电技术研究所, 四川 成都 610209
陈强:中国科学院光电技术研究所, 四川 成都 610209
伍凡:中国科学院光电技术研究所, 四川 成都 610209

联系人作者:侯溪(hxxh6776@163.com)

备注:侯溪(1980-), 男, 博士, 研究员, 博士生导师, 主要从事高精度光学检测技术研究及仪器研制。

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引用该论文

Hou Xi,Zhang Shuai,Hu Xiaochuan,Quan Haiyang,Wu Gaofeng,Jia Xin,He Yiwei,Chen Qiang,Wu Fan. The research progress of surface interferometric measurement with higher accuracy[J]. Opto-Electronic Engineering, 2020, 47(8): 200209

侯溪,张帅,胡小川,全海洋,吴高峰,贾辛,何一苇,陈强,伍凡. 超高精度面形干涉检测技术进展[J]. 光电工程, 2020, 47(8): 200209

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