深紫外、极紫外光刻、先进光源等现代光学工程牵引驱动超精密光学技术持续发展, 超精密光学制造要求与之精度相匹配的超高精度检测技术。作为核心技术指标之一的面形精度通常要求达到纳米、深亚纳米甚至几十皮米量级, 超高精度面形干涉检测技术挑战技术极限, 具有重要研究意义和应用价值。本文分析了面形干涉检测技术发展趋势, 主要介绍了中国科学院光电技术研究所近年来在超高精度面形干涉检测技术相关研究进展。

With the continuous development of modern optics, such as EUV, DUV lithography and the advanced light source, the surface interferometric measurement with higher accuracy has become an important challenge. The surface accuracy as one of key technical parameters will be required to nanometer, sub-nanometer, even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology, has important research significance and application value. This paper analyzes the development trends of surface interferometric measurement with higher accuracy and reports the related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences.