激光与光电子学进展, 2020, 57 (1): 011201, 网络出版: 2020-01-03
基于图像处理的线距测量方法 下载: 1212次
Line Spacing Measurement Method Based on Image Processing
测量 关键尺寸扫描电镜 线距标准样片 微纳尺寸 线性近似算法 图像处理 measurement critical dimension scanning electron microscope line spacing standard samples micro-nano size linear approximation algorithm image processing
摘要
关键尺寸扫描电镜(CD-SEM)是对微纳尺寸线距标准样片定标的标准器具。为提高标准样片的定标准确度,研究一种基于图像处理技术的测量算法。首先,对研制样片的特征进行分析;其次,研究线性近似算法和线距测量算法,并分别对100 nm~10 μm的线距标准样片进行测量;最后,利用纳米测量机进行对比实验研究。实验结果表明,线性近似算法的相对误差可以控制在0.45%以内,相比之下,线距测量算法的相对误差可控制在0.35%以内。因此,线距测量算法提高了线距的测量精度,为提高线距测量类仪器量值的可靠性、保证半导体器件制造精度提供了一种测量方案。
Abstract
The critical dimension scanning electron microscope (CD-SEM) is a standard instrument for standardizing micro- to nano-sized line spacing samples. To improve the calibration accuracy of samples, this paper studies a measurement algorithm based on image processing technology. First, the characteristics of the developed samples are analyzed. Second, the algorithms for micro- to nano-sized line spacing measurement and linear approximation are researched and the line spacing standard samples with a single period from 100 nm to ~10 μm are measured. Finally, a nano-measuring machine is used in comparative experiments. The experimental results show that the relative error of the linear approximation algorithm is controlled within 0.45%. In contrast, the relative error obtained by the line spacing measurement algorithm is controlled within 0.35%, thus improving the measurement accuracy of the line spacing. The algorithm provides a measurement scheme for improving the reliability of the line spacing measurement instrument and ensuring the precision of semiconductor device manufacturing.
张晓东, 赵琳, 韩志国, 冯亚南, 李锁印. 基于图像处理的线距测量方法[J]. 激光与光电子学进展, 2020, 57(1): 011201. Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201.