激光与光电子学进展, 2020, 57 (1): 011201, 网络出版: 2020-01-03  

基于图像处理的线距测量方法 下载: 1212次

Line Spacing Measurement Method Based on Image Processing
作者单位
中国电子科技集团公司第十三研究所, 河北 石家庄 050051
摘要
关键尺寸扫描电镜(CD-SEM)是对微纳尺寸线距标准样片定标的标准器具。为提高标准样片的定标准确度,研究一种基于图像处理技术的测量算法。首先,对研制样片的特征进行分析;其次,研究线性近似算法和线距测量算法,并分别对100 nm~10 μm的线距标准样片进行测量;最后,利用纳米测量机进行对比实验研究。实验结果表明,线性近似算法的相对误差可以控制在0.45%以内,相比之下,线距测量算法的相对误差可控制在0.35%以内。因此,线距测量算法提高了线距的测量精度,为提高线距测量类仪器量值的可靠性、保证半导体器件制造精度提供了一种测量方案。
Abstract
The critical dimension scanning electron microscope (CD-SEM) is a standard instrument for standardizing micro- to nano-sized line spacing samples. To improve the calibration accuracy of samples, this paper studies a measurement algorithm based on image processing technology. First, the characteristics of the developed samples are analyzed. Second, the algorithms for micro- to nano-sized line spacing measurement and linear approximation are researched and the line spacing standard samples with a single period from 100 nm to ~10 μm are measured. Finally, a nano-measuring machine is used in comparative experiments. The experimental results show that the relative error of the linear approximation algorithm is controlled within 0.45%. In contrast, the relative error obtained by the line spacing measurement algorithm is controlled within 0.35%, thus improving the measurement accuracy of the line spacing. The algorithm provides a measurement scheme for improving the reliability of the line spacing measurement instrument and ensuring the precision of semiconductor device manufacturing.

张晓东, 赵琳, 韩志国, 冯亚南, 李锁印. 基于图像处理的线距测量方法[J]. 激光与光电子学进展, 2020, 57(1): 011201. Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201.

引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!