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阵列波导光栅解复用器的偏振相关损耗的优化

Optimization of Polarization-Dependent Loss of Arrayed Waveguide Grating Demultiplexer

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摘要

对硅基二氧化硅阵列波导光栅解复用器(AWG DEMUX)的偏振相关损耗(PDL)进行了优化。理论分析了引起AWG偏振相关性的物理因素以及消除偏振相关性的工艺方法和条件。利用化学气相沉积、光刻和刻蚀等半导体工艺制备了AWG DEMUX芯片,并结合理论分析对包层材料中的硼(B)、磷(P)含量进行了优化调整,成功地将芯片的PDL降低至0.12 dB,使PDL参数满足芯片的商用化需求。

Abstract

In this work, the polarization-dependent loss (PDL) of a SiO2/Si arrayed waveguide demultiplexer (AWG DEMUX) is optimized. The physical factors causing the polarization dependence of the AWG and the process methods and conditions required to eliminate this dependence are analyzed theoretically. AWG DEMUX chips are fabricated by semiconductor processes, such as chemical-vapor deposition, photolithography, and etching. The boron and phosphorus contents in the cladding material are optimized and adjusted according to theoretical analysis. The PDLs of the chips are successfully reduced to 0.12 dB so that the PDL parameters meet the chip''s commercialization requirements.

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中图分类号:TN256

DOI:10.3788/CJL202047.0106003

所属栏目:光纤光学与光通信

收稿日期:2019-08-20

修改稿日期:2019-09-26

网络出版日期:2020-01-01

作者单位    点击查看

孙健:郑州大学物理学院, 河南 郑州 450001河南仕佳光子科技股份有限公司, 河南 鹤壁 458030
吴远大:河南仕佳光子科技股份有限公司, 河南 鹤壁 458030
吴卫锋:河南仕佳光子科技股份有限公司, 河南 鹤壁 458030
单崇新:郑州大学物理学院, 河南 郑州 450001

联系人作者:单崇新(cxshan@sohu.com)

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引用该论文

Sun Jian,Wu Yuanda,Wu Weifeng,Shan Chongxin. Optimization of Polarization-Dependent Loss of Arrayed Waveguide Grating Demultiplexer[J]. Chinese Journal of Lasers, 2020, 47(1): 0106003

孙健,吴远大,吴卫锋,单崇新. 阵列波导光栅解复用器的偏振相关损耗的优化[J]. 中国激光, 2020, 47(1): 0106003

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