首页 > 论文 > 激光与光电子学进展 > 56卷 > 14期(pp:141602--1)

旋涂法涂制溶胶凝胶改性SiO2减反膜性能研究

Properties of Sol-Gel-Modified SiO2 Antireflective Films by Spin Coating

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

运用溶胶改性和溶剂置换的方法制备以癸烷为溶剂的SiO2溶胶,通过单面旋涂方法在方形50 mm×50 mm×10 mm 的KDP晶体基片上制备均匀性良好的膜层。使用分光光度计测试涂膜的晶体基片,涂制三倍频及基频二倍频减反膜的KDP晶体基片在378 nm和835 nm处的透过率峰值均大于99.5%,膜层减反射效果良好。结合过滤技术及超声波清洗技术实现了膜层制备过程中的缺陷控制,将经过缺陷控制的三倍频减反膜涂制在洁净度高的熔石英陪涂片上,并在测试前进行激光(波长为355 nm,脉宽为3 ns)预处理,得到的三倍频减反膜的抗激光损伤阈值为(14.0±2.1) J·cm -2

Abstract

In this study, silica sol with decane as a solvent was prepared by the sol modification and solvent replacement method. A film with good uniformity was coated on 50 mm×50 mm×10 mm square KDP crystals using the single spin coating method. The optical properties of the film coated on the KDP crystals were tested using a spectrophotometer. The peak transmittance value of the KDP crystal substrate coated with the third harmonic frequency and the fundamental frequency of the second harmonic frequency antireflective films could achieve more than 99.5% at 378 nm and 835 nm, respectively. The defect control in the preparation process of the coating film was realized by the combination of the filtration and the ultrasonic cleaning technology. The third harmonic frequency antireflective film with defect control was coated on a high-cleanliness fused silica substrate and pretreated by laser conditioning before testing. The laser-induced damage threshold of the third harmonic frequency antireflective film reached (14.0 ± 2.1) J·cm -2 measured by a laser with 355 nm wavelength and 3 ns pulse width.

Newport宣传-MKS新实验室计划
补充资料

DOI:10.3788/LOP56.141602

所属栏目:材料

收稿日期:2019-01-23

修改稿日期:2019-02-21

网络出版日期:2019-07-01

作者单位    点击查看

沈斌:中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
李海元:中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
张旭:中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800

联系人作者:沈斌(bingo2011@siom.ac.cn)

【1】Thomas I M. High laser damage threshold porous silica antireflective coating. Applied Optics. 25(9), 1481-1483(1986).

【2】Belleville P F and Floch H G. Ammonia hardening of porous silica antireflective coatings. Proceedings of SPIE. 2288, 25-32(1994).

【3】Zhang W Q, Zhu C S, Zhang Q X et al. Investigation on porous silica anti-reflective coatings with high laser damage threshold. Chinese Journal of Lasers. 20(12), 916-920(1993).
张伟清, 朱从善, 章泉兴 等. 高激光负载多孔二氧化硅增透膜的研制. 中国激光. 20(12), 916-920(1993).

【4】Yang W, Li H B, Zhang Q H et al. Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films. High Power Laser and Particle Beams. 22(12), 2865-2870(2010).
杨伟, 李海波, 张清华 等. 改性剂对旋转法SiO2减反膜均匀性的影响. 强激光与粒子束. 22(12), 2865-2870(2010).

【5】Biswas P K, Sujatha Devi P, Chakraborty P K et al. Porous anti-reflective silica coatings with a high spectral coverage by sol-gel spin coating technique. Journal of Materials Science Letters. 22(3), 181-183(2003).

【6】Belleville P, Bonnin C and Priotton J J. Room-temperature mirror preparation using sol-gel chemistry and laminar-flow coating technique. Journal of Sol-Gel Science and Technology. 19, 223-226(2000).

【7】Xiong H. Moisture-resistant antireflective coatings for potassium dihydrogen phosphate(KDP) crystals. Beijing: Graduate University of the Chinese Academy of Sciences. (2010).
熊怀. KDP晶体SiO2基防潮减反膜研究. 北京: 中国科学院研究生院. (2010).

【8】Tang Y X, Zhang W Q, Zhou W P et al. Study of organic silicon resin protective coating with high laser damage threshold for KDP crystal. Chinese Journal of Lasers. B3(4), 469-475(1994).

【9】Wang Y, Cai Y M and Teng L. Status and trends of cleaning technology for superpolished surfaces. Aviation Precision Manufacturing Technology. 39(2), 1-4, 9(2003).
王宇, 蔡亚梅, 滕霖. 超光滑表面清洗技术现状及发展趋势. 航空精密制造技术. 39(2), 1-4, 9(2003).

【10】Si H. Study on adhesive mechanism of contamination on fused silica surface and characterization method of cleanliness. Harbin: Harbin Institute of Technology. (2015).
佀昊. 熔石英表面污染物粘附机理及洁净度表征方法研究. 哈尔滨: 哈尔滨工业大学. (2015).

【11】Zhang C L, Li X B, Lü H B et al. Influence of impurities on laser-induced damage of sol-gel SiO2 films. High Power Laser and Particle Beams. 23(5), 1267-1271(2011).
章春来, 李熙斌, 吕海兵 等. 杂质对溶胶-凝胶SiO2薄膜激光损伤的影响. 强激光与粒子束. 23(5), 1267-1271(2011).

【12】Luurtsema G A. Spin coating for rectangular substrates. Berkeley: University of California. (1997).

【13】Meyerhofer D. Characteristics of resist films produced by spinning. Journal of Applied Physics. 49(7), 3993-3997(1978).

【14】Fan Z X, Shao J D, Yi K et al. Optical thin films and applications. 379, (2014).
范正修, 邵建达, 易葵 等. 光学薄膜及其应用. 379, (2014).

【15】Guo Y J, Zu X T, Jiang X D et al. Laser-induced damage mechanism of the sol-gel single-layer SiO2 acid and base thin films. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 266(12/13), 3190-3194(2008).

【16】Zhang Y L, Zhang X X, Ye H P et al. Design, preparation and modification of third-harmonic silica antireflective coatings with different thickness. Chinese Journal of Inorganic Chemistry. 28(1), 119-124(2012).
张雨露, 张欣向, 业海平 等. 不同厚度三倍频SiO2增透膜的设计、制备与改性. 无机化学学报. 28(1), 119-124(2012).

【17】Li X, Liu X F, Zhao Y A et al. Influence of laser-conditioning on defects of SiO2 mono-layer films. Chinese Journal of Lasers. 37(6), 1626-1630(2010).
李笑, 刘晓凤, 赵元安 等. 激光预处理对SiO2单层膜中缺陷的影响. 中国激光. 37(6), 1626-1630(2010).

【18】Cui Y, Zhao Y A, He H B et al. Effects of ultrasonics cleaning and laser conditioning on the laser induced damage threshold of the antireflection. High Power Laser and Particle Beams. 18(10), 1712-1716(2006).
崔云, 赵元安, 贺洪波 等. 超声清洗与激光预处理对减反膜阈值的影响. 强激光与粒子束. 18(10), 1712-1716(2006).

【19】Xu J, Chen L X, You X H et al. Thermal stress damage of thin-film components induced by surface impurities. Acta Optica Sinica. 37(6), (2017).
徐娇, 陈丽霞, 游兴海 等. 表面杂质诱导薄膜元件的热应力损伤. 光学学报. 37(6), (2017).

【20】Xu J, Zhong Z Q, Huang R S et al. Thermal damages on thin-film components induced by surface impurities and its statistic characteristics. Laser & Optoelectronics Progress. 55(10), (2018).
徐娇, 钟哲强, 黄人帅 等. 表面杂质诱导薄膜元件的热损伤及其统计特性分析. 激光与光电子学进展. 55(10), (2018).

【21】Wang G X, Su J H, Xu J Q et al. Ignition time of laser-induced film plasma and its influence factors. Acta Optica Sinica. 37(4), (2017).
汪桂霞, 苏俊宏, 徐均琪 等. 激光诱导薄膜等离子体点燃时间及其影响因素. 光学学报. 37(4), (2017).

引用该论文

Bin Shen, Haiyuan Li, Xu Zhang. Properties of Sol-Gel-Modified SiO2 Antireflective Films by Spin Coating[J]. Laser & Optoelectronics Progress, 2019, 56(14): 141602

沈斌, 李海元, 张旭. 旋涂法涂制溶胶凝胶改性SiO2减反膜性能研究[J]. 激光与光电子学进展, 2019, 56(14): 141602

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF