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Adaptive gradient-based source and mask co-optimization with process awareness

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Abstract

We develop a source and mask co-optimization framework incorporating the minimization of edge placement error (EPE) and process variability band (PV Band) into the cost function to compensate simultaneously for the image distortion and the increasingly pronounced lithographic process conditions. Explicit differentiable functions of the EPE and the PV Band are presented, and adaptive gradient methods are applied to break symmetry to escape suboptimal local minima. Dependence on the initial mask conditions is also investigated. Simulation results demonstrate the efficacy of the proposed source and mask optimization approach in pattern fidelity improvement, process robustness enhancement, and almost unaffected performance with random initial masks.

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DOI:10.3788/COL201917.121102

所属栏目:Imaging Systems

基金项目:This work was partially supported by the National Natural Science Foundation of China (No. 61875041), the Natural Science Foundation of Guangdong Province (No. 2016A030313709), and the Guangxi Science Foundation (Nos. 2013GXNSFCA019019 and 2017GXNSFAA198227).

收稿日期:2019-04-24

录用日期:2019-08-06

网络出版日期:2019-12-03

作者单位    点击查看

Yijiang Shen:School of Automation, Guangdong University of Technology, Mega Education Center South, Guangzhou 510006, China
Fei Peng:School of Automation, Guangdong University of Technology, Mega Education Center South, Guangzhou 510006, China
Xiaoyan Huang:School of Automation, Guangdong University of Technology, Mega Education Center South, Guangzhou 510006, China
Zhenrong Zhang:Guangxi Key Laboratory of Multimedia Communications and Network Technology, School of Computer, Electronics and Information, Guangxi University, Nanning 530004, China

联系人作者:Yijiang Shen(yjshen@gdut.edu.cn)

备注:This work was partially supported by the National Natural Science Foundation of China (No. 61875041), the Natural Science Foundation of Guangdong Province (No. 2016A030313709), and the Guangxi Science Foundation (Nos. 2013GXNSFCA019019 and 2017GXNSFAA198227).

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引用该论文

Yijiang Shen, Fei Peng, Xiaoyan Huang, Zhenrong Zhang, "Adaptive gradient-based source and mask co-optimization with process awareness," Chinese Optics Letters 17(12), 121102 (2019)

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