光学学报, 2019, 39 (12): 1222002, 网络出版: 2019-12-06
基于差分进化算法的光刻机匹配方法 下载: 1388次
Lithographic Tool-Matching Method Based on Differential Evolution Algorithm
光学设计 光学制造 光刻 光刻机匹配 光源优化 差分进化 optical design optical fabrication lithography lithographic tool-matching source optimization differential evolution
摘要
提出一种基于差分进化算法和微反射镜阵列(MMA)光源模型的光刻机匹配方法。加入MMA光源模型,利用差分进化算法优化微反射镜光斑分布,以实现光刻机匹配。与通常用于自由照明系统的光刻机匹配方法相比,本方法能直接优化MMA参数,有效减小了在MMA产生照明光源的过程中出现的匹配误差。以一维线空掩模为匹配目标,分别对四极照明和自由照明光源进行匹配,匹配后关键尺寸误差的均方根(RMS)下降了80%以上,与基于遗传算法和粒子群优化算法相比,本方法的匹配结果更优并具有更快的收敛速度。此外,本方法还可以有效地控制生成光源的光瞳填充比例,使匹配前后光源的光瞳填充比例保持一致。
Abstract
A lithographic tool-matching method using a differential evolution algorithm and a micro mirror array (MMA) source model is proposed herein. In this method, the MMA source model is added, and the light spots of micro mirrors are optimized by the differential evolution algorithm to achieve lithographic tool-matching. Compared with other matching methods for the freeform illumination system, the proposed method can directly optimize MMA parameters and reduce matching errors in the process of MMA generating light source. A one-dimensional line/space mask is adopted for matching under quasar and freeform illumination. The simulation results show that the root-mean-square of critical dimension error decreases by more than 80% after matching. The proposed method outperforms the matching methods based on the genetic algorithm and particle swarm optimization algorithm. Further, the convergence is accelerated. Moreover, the proposed method can effectively control the pupil fill ratio and keep it constant before and after matching.
茅言杰, 李思坤, 王向朝, 韦亚一. 基于差分进化算法的光刻机匹配方法[J]. 光学学报, 2019, 39(12): 1222002. Yanjie Mao, Sikun Li, Xiangzhao Wang, Yayi Wei. Lithographic Tool-Matching Method Based on Differential Evolution Algorithm[J]. Acta Optica Sinica, 2019, 39(12): 1222002.