[1] 黄晚晴. 大口径熔石英元件表面激光损伤特性研究［D］. 绵阳: 中国工程物理研究院, 2009: 1-16.

    Huang Wanqing. Study on laser induced damage on the surface of large diameter fusedsilica［D］. Mianyang: China Academy of Engineering Physics, 2009: 1-16.

[2] Hoshino T, Kurata Y, Terasaki Y, et al. Mechanism of polishing of SiO2 films by CeO2 particles［J］. Journal of Non-crystalline Solids, 2001, 283(1): 129-136.

[3] Kamimura T, Akamatsu S, Horibe H, et al. Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength［J］. Japanese Journal of Applied Physics, 2004, 43: 1229-1231.

[4] 王 毅. 亚表面缺陷诱导损伤的机理与实验技术研究［D］. 绵阳: 中国工程物理研究院, 2005: 6-15.

    Wang Yi. Study on the mechanism and experimental technology of subsurface defect induced damage［D］. Mianyang: China Academy of Engineering Physics, 2005: 6-15.

[5] 王景贺, 张 磊, 王洪祥, 等. 基于荧光共聚焦技术熔石英亚表层损伤检测方法［J］. 中国激光, 2015, 42(4): 0406004.

    Wang Jinghe, Zhang Lei, Wang Hongxiang, et al. Fused quartz subsurface damage detecting method based on confocal fluorescence microscopy［J］. Chinese J Lasers, 2015, 42(4): 0406004.

[6] Stolz C J, Menapace J A, Sehaffers K I. Laser damage initiation and growth of antireflection coated S-FAP crystal surfaces prepared by pitch lap and magnetorheological finishing［C］. SPIE, 2005, 5991: 59911I.

[7] Bass I L, Guss G M, Nostrand M J, et al. An improved method of mitigating laser induced surface damage growth in fused silica using a rastered, pulsed CO2 laser［C］. SPIE, 2010, 7842: 784220.

[8] 赵东峰, 邬 融, 林尊琪, 等. 超声波辅助酸蚀提高熔石英损伤阈值［J］. 强激光与粒子束, 2015, 27(1): 1-6.

    Zhao Dongfeng, Wu Rong, Lin Zunqi, et al. Acid etching combined with ultrasonic for improving laser damage threshold of fused silica［J］. High Power Laser and Particle Beams, 2015, 27(1): 1-6.

[9] 万 稳, 戴一帆, 石 峰, 等. 提升熔石英抗激光损伤性能的磁流变与HF刻蚀结合方法［J］. 国防科技大学学报, 2015, 37(6): 8-11.

    Wan Wen, Dai Yifan, Shi Feng, et al. Improving the laser damage performance of fused silica by combining magnetorheological finishing with HF acid etching［J］. Journal of National University of Defense Technology, 2015, 37(6): 8-11.

[10] Ye H, Li Y G, Yuan Z G, et al. Improving UV laser damage threshold of fused silica optics by wet chemical etching technique［C］. SPIE. 2015, 9532: 953221.

[11] Suratwala T I, Miller P E, Bude J D, et al. HF-Based etching processes for improving laser damage resistance of fused silica optical surfaces［J］. Journal of the American Ceramic Society. 2011, 94(2): 416-428.