[1] J. Finders, M. Dusa, P. Nikolsky et al.. Litho and patterning challenges for memory and logic applications at the 22 nm node［C］. SPIE, 2010, 7640: 76400C

[2] V. Banine, R. Moors. Plasma source or EUV lithography exposure tools［J］. J. Phys. D: Appl. Phys., 2004, 37(23): 3207～3210

[3] 吴涛, 王新兵, 唐建 等. CO2激光锡等离子体极端紫外及可见光光谱［J］. 光学学报, 2012, 32(4): 0430002

    Wu Tao, Wang Xinbing, Tang Jian et al.. Extreme ultraviolet and visible emission spectroscopic characterization of CO2 laser produced tin plasma for lithography［J］. Acta Optica Sinica, 2012, 32(4): 0430002

[4] V. Bakshi. EUV Sources for Lithography［M］. Washington: SPIE Press, 2006. 3～41

[5] Y. Tao, M. S. Tillack, S. Yuspeh et al.. Interaction of a CO2 laser pulse with tin-based plasma for an extreme ultraviolet lithography source［J］. IEEE Trans. Plasma Sci., 2010, 38(4): 714～718

[6] S. S. Harilal, T. Sizyuk, A. Hassanein et al.. The effect of excitation wavelength on dynamics of laser-produced tin plasma［J］. J. Appl. Phys., 2011, 109(6): 063306

[7] S. Yuspeh, Y. Tao, R. A. Burdt et al.. Dynamics of laser-produced Sn microplasma for a high-brightness extreme ultraviolet light source［J］. Appl. Phys. Lett., 2011, 98(20): 201501

[8] J. R. Freeman, S. S. Harilal, A. Hassanein. Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications［J］. J. Appl. Phys., 2011, 110(8): 083303

[9] Wu Tao, Wang Xinbing, Wang Shaoyi et al.. Time and space resolved visible spectroscopic imaging CO2 laser produced extreme ultraviolet emitting tin plasmas［J］. J. Appl. Phys., 2012, 111(6): 063304

[10] 吴涛, 王新兵, 王少义 等. 基于脉冲CO2激光锡等离子体光刻光源的极紫外辐射光谱特性研究［J］. 光谱学与光谱分析, 2012, 32(7): 1729～1733

    Wu Tao, Wang Xinbing, Wang Shaoyi et al.. Characteristics of extreme ultraviolet emission from tin plasma using CO2 laser for lithography［J］. Spectroscopy and Spectral Analysis, 2012, 32(7): 1729～1733

[11] Y. Ueno, G. Soumagne, A. Sumitani et al.. Reduction of debris of a CO2 laser-produced Sn plasma extreme ultraviolet source using a magnetic field［J］. Appl. Phys. Lett., 2008, 92(21): 211503

[12] D. Bleiner, T. Lippert. Stopping power of a buffer gas for laser plasma debris mitigation［J］. J. Appl. Phys., 2009, 106(12): 123301

[13] S. S. Harilal, C. V. Bindhu, M. S. Tillack et al.. Internal structure and expansion dynamics of laser ablation plumes into ambient gases［J］. J. Appl. Phys., 2003, 93(5): 2380～2388

[14] D. B. Geohegan. Physics and diagnostics of laser ablation plume propagation for high-Tc superconductor film growth［J］. Thin Solid Films, 1992, 220(1-2): 138～145

[15] A. V. Rode, E. G. Gamaly, B. Luther-Davies. Formation of cluster-assembled carbon nano-foam by high repetition-rate laser ablation［J］. Appl. Phys. A, 2000, 70(2): 135～144

[16] A. Bailini, P. M. Ossi. Modelling the propagation of an ablation plume in a gas［J］. Radiation Effects & Defects in Solids, 2008, 163(4-6): 497～503