半导体光电, 2016, 37 (2): 154, 网络出版: 2016-05-11  

掺硼p型晶硅太阳电池LID恢复研究

Study on Lid Regenaration in Boron-Doped p-Type Crystalline Silicon Solar Cell
作者单位
1 横店集团东磁股份有限公司,浙江 东阳 322118
2 浙江大学 硅材料国家重点实验室,杭州 310027
引用该论文

陈健生, 董方, 杨德仁, 包大新, 赵锋, 傅晓敏. 掺硼p型晶硅太阳电池LID恢复研究[J]. 半导体光电, 2016, 37(2): 154.

CHEN Jiansheng, DONG Fan, YANG Deren, BAO Daxin, ZHAO Feng, FU Xiaomin. Study on Lid Regenaration in Boron-Doped p-Type Crystalline Silicon Solar Cell[J]. Semiconductor Optoelectronics, 2016, 37(2): 154.

参考文献

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陈健生, 董方, 杨德仁, 包大新, 赵锋, 傅晓敏. 掺硼p型晶硅太阳电池LID恢复研究[J]. 半导体光电, 2016, 37(2): 154. CHEN Jiansheng, DONG Fan, YANG Deren, BAO Daxin, ZHAO Feng, FU Xiaomin. Study on Lid Regenaration in Boron-Doped p-Type Crystalline Silicon Solar Cell[J]. Semiconductor Optoelectronics, 2016, 37(2): 154.

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