激光与光电子学进展, 2017, 54 (12): 120501, 网络出版: 2018-01-02   

激光干涉光刻制备976 nm分布反馈式激光器光栅 下载: 754次

Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography
作者单位
1 长春理工大学高功率半导体激光国家重点实验室, 吉林 长春 130022
2 长春理工大学高功率半导体激光器家重点实验室, 吉林 长春 130022
引用该论文

白云峰, 范杰, 邹永刚, 王海珠, 海一娜, 田锟. 激光干涉光刻制备976 nm分布反馈式激光器光栅[J]. 激光与光电子学进展, 2017, 54(12): 120501.

Bai Yunfeng, Fan Jie, Zou Yonggang, Wang Haizhu, Hai Yina, Tian Kun. Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography[J]. Laser & Optoelectronics Progress, 2017, 54(12): 120501.

参考文献

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白云峰, 范杰, 邹永刚, 王海珠, 海一娜, 田锟. 激光干涉光刻制备976 nm分布反馈式激光器光栅[J]. 激光与光电子学进展, 2017, 54(12): 120501. Bai Yunfeng, Fan Jie, Zou Yonggang, Wang Haizhu, Hai Yina, Tian Kun. Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography[J]. Laser & Optoelectronics Progress, 2017, 54(12): 120501.

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