Frontiers of Optoelectronics, 2012, 5 (2): 171, 网络出版: 2013-02-23  

Development and prospect of near-field optical measurements and characterizations

Development and prospect of near-field optical measurements and characterizations
作者单位
State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084, China
摘要
Abstract
Scanning near-field optical microscopy (SNOM) is an ideal experimental measuring system in nano-optical measurements and characterizations. Besides microscopy with resolution beyond the diffraction limit, spectroscope with nanometer resolution and other instruments with novel performances have been indispensable for researches in nano-optics and nanophotonics. This paper reviews the developing history of near-field optical (NFO) measuring method and foresees its prospects in future. The development of NFO measurements has gone through four stages, including optical imaging with super resolution, near-field spectroscopy, measurements of nanooptical parameters, and detections of near-field interactions. For every stage, research objectives, technological properties and application fields are discussed.

Jia WANG, Qingyan WANG, Mingqian ZHANG. Development and prospect of near-field optical measurements and characterizations[J]. Frontiers of Optoelectronics, 2012, 5(2): 171. Jia WANG, Qingyan WANG, Mingqian ZHANG. Development and prospect of near-field optical measurements and characterizations[J]. Frontiers of Optoelectronics, 2012, 5(2): 171.

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