Frontiers of Optoelectronics, 2008, 1 (3): 305, 网络出版: 2012-11-06
SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability
SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability
thin film optics solar He-II radiation extreme ultraviolet multilayer reflective mirror magnetron sputtering synchrotron radiation
摘要
Abstract
In applications of solar physics, extreme ultraviolet imaging of solar corona by selecting the He-II (l530.4 nm) emission line requires high reflectivity multilayer mirrors. Some material combinations were studied to design the mirrors working at a wavelength of 30.4 nm, including SiC/Mg, B4C/Mg, C/Mg, C/Al, Mo/Si, B4C/Si, SiC/Si, C/Si, and Sc/Si. Based on optimization of the largest reflectivity and the narrowest width for the multilayer mirror, a SiC/Mg material combination was selected as the mirror and fabricated by a magnetron sputtering system. The layer thicknesses of the SiC/Mg multilayer were measured by an X-ray diffractometer. Reflectivities were then measured on beamline U27 at the National Synchrotron Radiation Laboratory (NSRL) in Hefei, China. At a wavelength of 30.4 nm, the measured reflectivity is as high as 38.0%. Furthermore, a series of annealing experiments were performed to investigate the thermal stability of the SiC/Mg multilayer.
Jingtao ZHU, Da XU, Shumin ZHANG, Wenjuan WU, Zhong ZHANG, Fengli WANG, Bei WANG, Cunxia LI, Yao XU, Zhanshan WANG, Lingyan CHEN, Hongjun ZHOU, Tonglin HUO. SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability[J]. Frontiers of Optoelectronics, 2008, 1(3): 305. Jingtao ZHU, Da XU, Shumin ZHANG, Wenjuan WU, Zhong ZHANG, Fengli WANG, Bei WANG, Cunxia LI, Yao XU, Zhanshan WANG, Lingyan CHEN, Hongjun ZHOU, Tonglin HUO. SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability[J]. Frontiers of Optoelectronics, 2008, 1(3): 305.