激光与光电子学进展, 2017, 54 (3): 033101, 网络出版: 2017-03-08   

NbSiN薄膜的制备及光学性能研究

Preparation and Optical Property of NbSiN Films
作者单位
重庆大学材料科学与工程学院, 重庆 400045
摘要
采用射频磁控溅射法,以铌靶和硅靶为靶材,在玻璃基片上沉积了NbSiN薄膜。研究了硅靶、铌靶功率、氮气流量以及溅射时间对薄膜光学性能的影响,得出实验室条件下的最佳制备工艺参数。测试结果表明,最佳工艺参数下制备的NbSiN薄膜均匀致密,主要成分为NbN、NbSiN、无定形的Si3N4及少量的SiO2和Nb2N2-xO3+x。光学性能分析表明,NbSiN薄膜在波长550 nm处(人眼最敏感)的可见光透射率为90.5%,红外反射率约为28%,光学性能优异。
Abstract
NbSiN films are deposited on glass substrates with radio frequency (RF) magnetron sputtering method by taking Nb and Si as targets. The effects of powers of silicon target and niobium target, flow rate of nitrogen and sputtering time on optical properties of films are studied, and the optimal preparation process paremeters are obtained. The test results show that the films are uniformly and compactly deposited under the optimal process paremeters, which mainly compose of NbN, NbSiN, amorphous Si3N4, and little SiO2 and Nb2N2-xO3+x. The optical property analysis shows that the visible light transmissivity of NbSiN films is 90.5% at 550 nm (the most sensitive wavelength for human eyes) and the infrared reflectivity is about 28%, which indicates that the optical property is excellent.

张易君, 张粞程, 栾明昱, 曾陶, 黄佳木. NbSiN薄膜的制备及光学性能研究[J]. 激光与光电子学进展, 2017, 54(3): 033101. Zhang Yijun, Zhang Xicheng, Luan Mingyu, Zeng Tao, Huang Jiamu. Preparation and Optical Property of NbSiN Films[J]. Laser & Optoelectronics Progress, 2017, 54(3): 033101.

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