对苯基、萘基和蒽基在中位取代的氟硼二吡咯(BODIPY)衍生物薄膜的放大自发辐射(ASE)性能进行了研究, 探讨了影响材料ASE稳定性的因素。首先,将3种BODIPY衍生物材料PhBOD、NaBOD和EnBOD掺入聚苯乙烯经溶液旋涂法制备成薄膜, 接下来测试了吸收光谱和荧光光谱, 然后在光泵浦条件下测量了3种样品的ASE性能, 获得了材料的ASE阈值。进一步通过长时间泵浦、环境中长时间放置和高温环境下泵浦等方法研究了材料的光稳定性、ASE环境稳定性和热稳定性。最后使用Gaussian 09计算了分子基态性质。实验结果表明, PhBOD、NaBOD和EnBOD薄膜的初始阈值分别为12.4, 4.55, 3.4 kW/cm2,其中PhBOD有较强的ASE稳定性。ASE稳定性差异可能与分子结构的共轭程度和化学稳定性相关。分子中各个基团的共轭程度较大、Mulliken电荷分布对称性较好的材料具有较好的ASE稳定性。

The amplified spontaneous emission (ASE) properties of phenyl, naphthyl and anthracene substituted boron dipyrromethene (BODIPY) derivative films were studied, and the factors that influence the ASE stability of BODIPY derivatives were discussed. First, three BODIPY derivatives (PhBOD, NaBOD and EnBOD) materials were doped into polystyrene, from which the films were prepared by spin-coating. The absorption and fluorescence spectra were recorded. The ASE performance of the three samples was measured under the optical pumping, and the ASE thresholds of the materials were obtained. The optical stability, ASE environmental stability and thermal stability of the materials were studied by means of long time pumping, long time placement in the environment and pumping under high temperature environment. Finally, Gaussian 09 was used to calculate the molecular ground state properties. Experimental results show that the initial thresholds of PhBOD, NaBOD and EnBOD films are about 12.4, 4.55, 3.4 kW/cm2, respectively. Among them, PhBOD film shows better ASE stability. The difference of ASE stability may be related to the conjugation degree and chemical stability of molecular structure. The ASE stability of the material would be better when the conjugation degree of each group in the molecule is larger, and the Mulliken charge distribution is more symmetrical.