发光学报, 2017, 38 (4): 514, 网络出版: 2017-05-03   

激基复合物给体作间隔层对激子复合区域的调节

Adjustment of Exciton Recombination Zone by Utilizing The Donor of Exciplex as Spacer Layer
作者单位
华东理工大学理学院 物理系, 上海 200237
摘要
为研究激基复合物器件激子复合区域的变化, 在TPD/BPhen界面可形成激基复合物发光的基础上, 以Ir(pq)2(acac)为探测层, 制备器件ITO/MoO3(2.5 nm)/TPD((40-x) nm)/Ir(pq)2(acac)(0.5 nm)/TPD(x, x=0,3,6,10 nm)/BPhen(40 nm)/Cs2CO3/Al, 其中靠近BPhen的TPD称之为间隔层。电致发光光谱表明, 该组器件的激子复合区域主要位于Ir(pq)2(acac)薄层和TPD/BPhen界面, 分别发射595 nm和478 nm的光。随着TPD间隔层厚度的增加和电压的升高, 发光区域向激基复合物区域(TPD/BPhen界面)移动, 即更多的电子和空穴在TPD/BPhen界面形成激基复合物发光, Ir(pq)2(acac)发光减弱。当间隔层厚度由0 nm增至10 nm时, 6 V电压下的Ir(pq)2(acac)和激基复合物发光强度的比值由44降至1.5。对于间隔层厚度为6 nm的器件, Ir(pq)2(acac)和激基复合物发光强度的比值由6 V时的2.8降至10 V时的1.0。由此可见, 激基复合物给体作间隔层能有效调节激子复合区域。
Abstract
In order to adjust the exciton recombination zone of exciplex-based organic light-emitting diodes, four devices were fabricated by employing Ir(pq)2(acac) as a prober and utilizing the donor of exciplex as a spacer. The device structures are ITO/MoO3(2.5 nm)/TPD((40-x) nm)/Ir(pq)2(acac)(0.5 nm)/TPD(x, x=0, 3, 6, 10 nm)/BPhen(40 nm)/Cs2CO3/Al, where x is the thickness of the spacer layer and the TPD/BPhen interface produces the exciplex emission. The electroluminescent spectra of the four devices include two main peaks: 478 nm and 595 nm, which originate from the TPD/BPhen interface and Ir(pq)2(acac) layer , respectively. As both the thickness of TPD spacer and the applied voltage increase, the recombination zone shifts towards TPD/BPhen interface. That is, more electrons and holes recombine at the interface between TPD and BPhen, leading to the decreased intensity of Ir(pq)2(acac) emission. For instance, under an applied voltage of 6 V, the intensity ratio of emission from Ir(pq)2(acac) and exciplex (IIr complex∶Iexciplex) is 44.0 and 1.5 for the devices with 0 and 10 nm spacer, respectively. The value of IIr complex∶ Iexciplex decreases from 2.8 at 6 V to 1.0 at 10 V for the device with 6-nm-thick TPD spacer. Therefore, the recombination region can be effectively tuned by utilizing the donor of exciplex as a spacer.

高浩锋, 方圣欢, 张叶峰, 陆勍, 吕昭月. 激基复合物给体作间隔层对激子复合区域的调节[J]. 发光学报, 2017, 38(4): 514. GAO Hao-feng, FANG Sheng-huan, ZHANG Ye-feng, LU Qing, LYU Zhao-yue. Adjustment of Exciton Recombination Zone by Utilizing The Donor of Exciplex as Spacer Layer[J]. Chinese Journal of Luminescence, 2017, 38(4): 514.

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