设计了45°入射反中波透长波分束膜系,并进行了误差仿真分析。选用“Ge+ZnS”和“ZnS+YF3”两组高、低折射率材料,采用离子辅助电子束蒸发技术,经过大量的镀制实验与工艺改进,解决了薄膜应力累积、不牢固、波长易偏移等问题,获得了45°入射中波红外3.7～4.8 μm波段反射率R≥98%,长波红外7.7～10.3 μm波段透过率T≥95%、光学性能良好的反中波透长波红外分束膜。镀膜样品一次性通过了GJB 2485-1995规定的高低温及附着力试验。试验结果表明,膜层致密性和附着力良好。

The 45° incident HR-MWIR/AR-LWIR beamspletter is designed and the error simulation analysis is carried out. Two groups of high-low refractive index materials such as “Ge + ZnS” and “ZnS + YF3” were selected, and IBAD technique was used. The beamspliter (R≥98% on 3.7～4.8 μm, T≥95% on 7.7～10.3 μm) was manufactured after a great deal of experiment. The problem of stress accumulation, poor adhesion and wavelength shift were solved. The coated samples were passed through the thermocycling and adhesion test specified by GJB 2485-1995 at one time. The test results show that the physical performance of the coating sample was excellent.