光谱学与光谱分析, 2017, 37 (9): 2826, 网络出版: 2017-10-16   

CCD紫外增强薄膜旋涂法工艺优化

Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating
作者单位
1 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 吉林 长春 130033
2 长春理工大学光电工程学院, 吉林 长春 130033
摘要
在硅基探测器的入射窗上制备荧光下转换薄膜, 是一种有效降低成本的紫外荧光增强技术。 从理论上探讨了由聚二甲基硅氧烷与颜料黄101混合胶体的紫外荧光薄膜旋涂工艺参数与性能之间关系, 搭建紫外荧光薄膜应用于光谱分析的性能测试实验平台, 对紫外荧光增强薄膜旋涂工艺参数质量配比、 旋涂转速进行优化。 光谱分析探测器有两个主要指标, 光谱响应灵敏度和光谱分辨率, 分析与实验结果表明, 利用旋涂法制备紫外增强荧光薄膜, 旋涂转速将直接影响薄膜的厚度、 表面粗糙度和荧光物质的分布, 从而影响光谱分析系统的分辨率; 紫外荧光增强薄膜的增强效率与荧光溶剂聚二甲基硅氧烷与荧光物质颜料黄101的质量比密切相关, 质量比低无法满足对紫外响应效率的提高, 但高质量比, 荧光物质处在聚集态荧光自猝灭严重, 也不利于增强薄膜的紫外响应效率。 最终, 在薄膜旋涂工艺优化的基础上, 旋涂转速2 500~3 000 r·min-1, 荧光物质与荧光溶剂质量比为7∶100制备出紫外荧光增强薄膜。 汞灯特征光谱测试结果表明该薄膜313 nm紫外波长处探测响应灵敏度提高了1.6倍左右, 对比分析镀膜前后特征光谱的半波带宽, 镀制紫外增强荧光薄膜对其影响很小。
Abstract
Fluorescence conversion film produced through the entrance window of silicon substrate detector is an effective method to reduce the cost of ultraviolet fluorescence enhancement technology. We theoretically discussed the relationship between spin-coating process parameters and properties of UV fluorescence film, a colloid admixture of polydimethylsiloxane and pigment yellow 101. To make further efforts, we set up an experimental platform for the performance measurement of UV fluorescent films, then optimized the mass ratio and spin speed of the spin coating process parameters for the films. There are two primary parameters evaluating spectral analysis detector: one is spectral response sensitivity, the other is spectral resolution. The analysis and experimental results show that the spin speed of making fluorescence films by spin-coating will directly affect the thickness, surface roughness of the film and distribution of fluorescence material, which then affects the resolution of the spectrum analysis system. The efficiency of the UV fluorescence enhanced film is closely related to the mass ratio of fluorescent solvent polydimethylsiloxane and fluorescent material pigment yellow 101. Low mass ratio cannot enhance UV-responsive sensitivity, but high mass ratio and the self fluorescence-quecher effect will reduce it. Eventually, we prepared UV fluorescence enhancement films based on the optimization of film spin coating process. The spin-coating speed was 2 500 to 3 000 r·min-1 and the mass ratio of the fluorescent substance to the fluorescent solvent was 7%. The characteristic spectrum testing results of the mercury lamp indicated that after coating films, UV-responsive sensitivity was improved nearly 1.6 times at 313 nm. Analyzing FWHM of characteristic spectrum with and without coating film, we discovered that there was no effect after coating.

冯宇祥, 孟银霞, 张国玉, 吴一辉, 郝鹏. CCD紫外增强薄膜旋涂法工艺优化[J]. 光谱学与光谱分析, 2017, 37(9): 2826. FENG Yu-xiang, MENG Yin-xia, ZHANG Guo-yu, WU Yi-hui, HAO Peng. Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating[J]. Spectroscopy and Spectral Analysis, 2017, 37(9): 2826.

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