利用直流非平衡磁控溅射技术，在100℃条件下，在单晶硅上制备了具有红外增透效果的类金刚石薄膜，研究了偏压对薄膜结构、机械性能和红外光学性能的影响，解释了薄膜结构与性能之间的关系。利用场发射扫描电镜（FESEM）、Dektak150 型台阶仪、Raman 光谱仪、纳米压痕仪、椭偏仪和傅里叶红外吸收光谱仪表征薄膜形貌、结构、硬度、折射率和红外光学性能。实验结果表明：在偏压为－100V 时，薄膜中sp³ 相含量最高，得到最大的纳米硬度14.8 GPa 和最大折射率2.36，此时透光率为67.3%；在偏压为－200V 时，薄膜硬度为11.2 GPa，薄膜的折射率为2.06，最接近零反射膜所需折射率，此时透过率最大。

Based on the concept of the direct current unbalanced magnetron sputtering technology, a series of diamond-like carbon(DLC) films with antireflection effect was prepared on a silicon substrate by changing the negative bias voltage at a deposition temperature of 100℃. Field emission scanning electron microscopy (FESEM), profilometry (Dektak150), Raman spectroscopy, nano indentation, elliptic partial techniques, and Fourier infrared absorption spectroscopy were used to characterize the morphology, structure, hardness, refractive index, and IR optical performances of the films. The experimental results for different biases showed the highest sp³ content, largest nanohardness of 14.8 GPa, maximum refractive index of 2.36, and transmission rate of 67.3% for a bias voltage of －100 V. The hardness of the film was 11.2 GPa and the refractive index was 2.06, which was the closest to the refractive index of zero reflection films, when the bias voltage was －200 V. For this value, the film also demonstrated the maximum transmittance.