红外与激光工程, 2018, 47 (1): 0106002, 网络出版: 2018-01-30  

基于等效电路参数提取的硅光电二极管激光损伤机理分析

Analysis of laser-induced damage mechanism in Si photodiode based on parameter extraction of equivalent circuit
作者单位
西北核技术研究所 激光与物质相互作用国家重点实验室, 陕西 西安 710024
摘要
通过硅光电二极管激光辐照效应实验获取了辐照前后器件的I-V特性曲线, 利用粒子群优化算法对二极管的等效电路参数进行提取, 考察受损前后等效参数的变化规律。认为光电二极管在激光辐照受损后, 其反向饱和电流会减小, 等效串联电阻会增大, 等效并联电阻会减小。随后, 基于半导体物理理论, 对这些参数变化的内在因素进行了定性分析。认为反向饱和电流减小是由掺杂离子浓度减小造成的, 串联电阻增大是因掺杂离子浓度以及载流子寿命减小共同引起的, 并联电阻减小则是由半导体表面及内部的缺陷引起的。
Abstract
Combined with particle swarm optimization (PSO) algorithm, the parameter of photodiode was extracted from I-V characteristics curve based on the equivalent circuit which was obtained before and after irradiation on Si photodiode. Then the experimental law of equivalent parameter before and after being damaged was acquired. When the photodiode was damaged, the reverse saturation current was decreased and the series resistance was increased, and the shunt resistance was decreased. The damage mechanism was given qualitatively based on semiconductor physics theory. The decrease of the reverse saturation current was on account of decrease in doping concentration. The increase of series resistance was due to the decrease in doping concentration and carrier lifetime. The decrease of the shunt resistance was caused by the defects in the surface and internal of semiconductor.

师宇斌, 张检民, 张震, 林新伟, 程德艳, 窦鹏程. 基于等效电路参数提取的硅光电二极管激光损伤机理分析[J]. 红外与激光工程, 2018, 47(1): 0106002. Shi Yubin, Zhang Jianmin, Zhang Zhen, Lin Xinwei, Cheng Deyan, Dou Pengcheng. Analysis of laser-induced damage mechanism in Si photodiode based on parameter extraction of equivalent circuit[J]. Infrared and Laser Engineering, 2018, 47(1): 0106002.

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