基于单喷嘴射流抛光去除机理，研究了抛光颗粒尺度分布理想均匀时，颗粒直径和抛光液质量分数变化对冲击去除分布的影响。在此基础上，考虑到实际加工过程中，抛光粉颗粒不可避免地存在分布不均匀的情况，在非理想不均匀条件下，提出了一种分析颗粒尺度的材料去除特性模型，重点研究了不同颗粒尺度分布范围对材料去除特性的影响。结果表明：在理想状态下，冲击去除随着抛光颗粒直径的增大而减小，随着抛光液质量分数的增大而增大。当颗粒直径随机分布时，材料去除量将出现明显的波动，抛光液质量分数的增大使去除量波动也增加，去除量波动的大小与抛光粉颗粒的平均直径直接相关，且与理想均匀状态下的去除特性相比，颗粒分布不均匀性使得材料的去除量有所增大。

Based on the jet polishing mechanism of single nozzle structure, the impact caused by the variations of particle diameter and polishing liquid concentration is studied. In consideration of the actual manufacture process, the particle diameters is nonuniform, thus a theoretical model has been established to discuss the material removal characteristic at the non-ideal condition.The impact of different particle size distribution on the material removal characteristics is mainly investigated. The results show that the material removal amount decreases with the increase of particle diameters, it increases with the increase of the mass concentration of the polishing solution. In addition, when the particle size is randomly distributed, significant fluctuation appears in material removal. The magnitude of the fluctuation is directly related to the average diameter of the polishing particles. Compared with the ideal uniform distribution, the removal amount caused by the un-uniform particles is relatively bigger.