微结构表面设计是提高太阳能电池光电转换效率的主要方法之一。微结构可以增加入射光的吸收率, 减小反射率, 达到提高太阳能电池光电转换效率的目的。本文采用全息光刻和湿法刻蚀技术在ITO玻璃片上制备周期为300 nm的孔阵图形, 以P3HT和PCBM作为电池活性层的给体材料和受体材料。实验结果表明微结构可以提高ITO/PEDOT:PSS/P3HT:PCBM/Al有机太阳能电池光电转换效率。当孔阵图形刻蚀深度达到60 nm时, 光电转换效率提高了约8 %。实验证实, 孔阵图形的采用增加了入射光的吸收, 提高了太阳能电池光电转换效率。

The surface microstructure is one of the approaches to improve the photoelectric conversion efficiency of solar cells. The surface microstructure can increase the absorptivity and reduce the reflectivity of incident light, so as to improve the photoelectric conversion efficiency of solar cells. In this paper, the holographic lithography and wet etching techniques were adopted to prepare 300 nm periodic hole array patterns on the ITO glass for the solar cell with P3HT and PCBM as the donor and receptor materials of active layer, respectively. The experimental results show that the surface microstructure could improve the photoelectric conversion efficiency of ITO/PEDOT:PSS/P3HT:PCBM/Al organic solar cells. With the optimum hole array etching depth of 60 nm, the photoelectric conversion efficiency of organic solar cell can be improved by around 8%. It is indicated that the use of hole array patterns could actually increase the absorption of incident light and improve the photoelectric conversion efficiency of solar cells.