光学学报, 2018, 38 (5): 0505003, 网络出版: 2018-07-10   

电子束光刻-近场全息法制作平焦场光栅的误差分析及补偿方法 下载: 1094次

Errors Analysis of Flat-Field Gratings Fabricated by EBL-NFH and Errors Compensation
作者单位
中国科学技术大学国家同步辐射实验室, 安徽 合肥 230029
摘要
在激光等离子体诊断等领域中,以平焦场光栅为核心器件的软X射线光谱仪发挥着重要作用。利用电子束光刻-近场全息法制作的平焦场光栅兼具电子束光刻线密度变化灵活,以及全息光栅低杂散光、抑制高次谐波等的特点。采用光线追迹方法分析电子束光刻-近场全息法制作平焦场光栅的主要制作误差对其光谱成像特性的影响。结果表明:电子束光刻制备熔石英掩模和近场全息图形转移过程的制作误差均会导致谱线展宽;以目前应用较多的软X射线平焦场光栅(中心线密度为2400 line/mm、工作波段在0.8~6.0 nm)为例,当熔石英掩模在光栅矢量方向的长度为50 mm时,电子束光刻分区数目应保证在1500以上;熔石英掩模线密度偏差引入的谱线展宽可以通过调整近场全息制作参数来消除;确定了近场全息中的两个主要影响因素--熔石英掩模与光栅基底的间距和夹角;近场全息中各误差因素之间有相互补偿的效果,故除了尽可能消除制备过程中的每一种制作误差外,也可以通过优化不同误差之间的分配来降低制备误差。本研究对优化电子束直写掩模策略、降低掩模制作难度、设计和调整近场全息光路有重要帮助。
Abstract
Soft X-ray spectrographs based on flat-field diffraction gratings play important roles in the fields of laser plasma diagnostics, etc. The flat-field gratings fabricated by electron beam lithography-near field holography (EBL-NFH) integrate the advantages of both sides, including the flexibility and high accuracy of spatial distribution of groove density due to EBL, and low stray light and low high-order harmonics similar to those of holographic gratings. This paper simulates the effect of dominating fabrication errors during EBL and NFH on the spectral images of flat-field gratings based on ray tracing theory. The results indicate that the fabrication errors of EBL and NFH will broaden spectral lines and degrade spectral images. We take a typical soft X-ray flat-field grating with a central density of 2400 lines/mm ranging from 0.8 nm to 6.0 nm as an example, when the length of the fused silica mask is 50 mm (along the direction of grating vector), the segment number should not be less than 1500. And the broadening of spectral lines due to the groove density error of the fused silica mask during EBL can be compensated by adjusting the parameters of NFH, such as the spacing and angle between the fused silica mask and the photoresist-coated grating substrate. The dominating factors are spacing and angle between the fused silica mask and the photoresist-coated grating substrate. And during NFH, rather than removing every fabrication parameter errors, the spectral line broadening can be eliminated by optimizing relative values among different errors. The simulation results are helpful to optimize the EBL-writing strategy for the mask, reduce the complexity of mask fabrication, and design and adjust the light path of NFH.

林达奎, 陈火耀, 刘正坤, 刘颖. 电子束光刻-近场全息法制作平焦场光栅的误差分析及补偿方法[J]. 光学学报, 2018, 38(5): 0505003. Dakui Lin, Huoyao Chen, Zhengkun Liu, Ying Liu. Errors Analysis of Flat-Field Gratings Fabricated by EBL-NFH and Errors Compensation[J]. Acta Optica Sinica, 2018, 38(5): 0505003.

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