强激光与粒子束, 2018, 30 (6): 061001, 网络出版: 2018-06-12  

磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜

Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm
作者单位
1 同济大学 物理科学与工程学院, 先进微结构材料教育部重点实验室, 上海 200092
2 中国科学院 高能物理研究所, 北京 100049
摘要
用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8~11.0 nm波段的[Mo/B4C]60横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明, 多层膜周期厚度沿着长轴方向从4.39 nm逐渐增加到7.82 nm, 周期厚度平均梯度为0.054 nm/mm。对横向梯度多层膜沿长轴方向每隔5 mm进行了一次同步辐射反射率测试, 结果显示, 横向梯度多层膜在45°入射角下的反射率约为10%, 反射峰的半高全宽介于0.13 nm到0.31 nm之间。
Abstract
Laterally graded periodic [Mo/B4C]60 multilayer mirrors for an EUV interval of 6.8-11.0 nm were deposited by direct current magnetron sputtering on silicon substrate. The structure properties and performance of laterally graded [Mo/B4C]60 multilayers were investigated by grazing X-ray reflectivity measurements and synchrotron radiation reflectance measurements. The results show that the multilayer period thickness D-spacing varies linearly from 4.39 nm to 7.82 nm in the long direction of the sample, indicating the average D-spacing gradient of 0.054 nm/mm. Reflectance of all measured point on the mirror is about 10% at the incident angle of 45°. Spectral width (FWHM) of the reflectance peaks varies from 0.13 nm to 0.31 nm with the increase of multilayer period thickness.

朱京涛, 李淼, 朱圣明, 张嘉怡, 冀斌, 崔明启. 磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜[J]. 强激光与粒子束, 2018, 30(6): 061001. Zhu Jingtao, Li Miao, Zhu Shengming, Zhang Jiayi, Ji Bin, Cui Mingqi. Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J]. High Power Laser and Particle Beams, 2018, 30(6): 061001.

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