研究了金刚石聚晶碳膜的生长过程, 以及不同生长阶段碳膜的场发射性能。通过磁控溅射法在陶瓷上镀一层金属钛作为制备碳膜的衬底, 将衬底放入微波等离子体化学气相沉积腔中, 经过不同的沉积时间制备出一系列的碳膜。利用SEM、Raman光谱仪、X射线衍射仪等仪器, 对碳膜进行了形貌与成分分析, 最后利用二极结构场发射装置, 测试了碳膜的场发射性能。着重讨论了金刚石聚晶碳膜生长过程中的变化, 并且对金刚石聚晶碳膜的场发射机理进行了深入研究。

In this paper, the growth process of diamond polycrystalline carbon films and the emission properties of carbon films at different growth stage were studied. A series of carbon films were prepared by depositing the substrate in a microwave plasma chemical vapor deposition chamber after coating the ceramic substrate with a layer of metal titanium. The morphology and composition of carbon films were analyzed by scanning electron microscopy (SEM), Raman spectroscopy (Raman) and X-ray diffraction (XRD). Finally, the field emission performance of carbon film was tested by using the secondary structure field launcher. The change regularity of diamond polycrystalline carbon film is discussed, and the excellent field emission mechanism of diamond polycrystalline carbon film is studied.