采用射频磁控溅射技术, 以WO3陶瓷靶为原料, 在透明导电氧化铟锡(ITO)玻璃上沉积了非晶相WO3薄膜, 研究了溅射功率对薄膜结构及光学性质的影响, 并研究了WO3薄膜的电致变色特性。利用扫描电子显微镜(SEM)、X射线衍射技术(XRD)表征了薄膜的表面形貌和内部结构; 利用UV-Vis分光光度计表征了薄膜在变色前后的光学透过性质, 利用电化学测试工作站研究了WO3薄膜的电致变色性质, 并从原理上分析了WO3薄膜的变色机理。研究结果表明, 不同功率下获得的WO3薄膜均为非晶结构, 在可见光范围内有较高的透过率。透明的WO3薄膜在负向电压下逐渐转变成深蓝色, 且在撤去电压后其颜色不变, 当施加正向电压时, 薄膜又转换为透明态, 表现出良好的电致变色特性。所制备WO3薄膜在550nm处褪色态的透过率为83%, 着色态的透过率为29%, 使得该薄膜在智能窗方面具有广阔的应用前景。

By RF magnetron sputtering, amorphous WO3 thin films was prepared on the substrate of transparent and conductive indium tin oxide (ITO) glass by using WO3 ceramic target as the raw material. The effects of sputtering power on the structure and optical properties of the films, and the electrochromic properties of WO3 film were studied. The internal structure and surface morphology of the films were characterized by XRD and SEM. The optical transmission properties of the films before and after color change were characterized by UV-Vis spectrophotometer. The electrochromic properties of WO3 films were studied by electrochemical testing workstation. Based on the analysis of experimental data, the mechanism of discoloration of WO3 films was analyzed in principle. The results show that the WO3 films obtained at different power are amorphous and show high transmittance in the visible light range. Transparent WO3 thin films in the negative voltage gradually change into deep blue, and keep blue when the voltage is removed. When forward voltage is applied on the film, it turns to be transparent again, showing good electrochromic characteristics. The transmittance of the WO3 films prepared by RF magnetron sputtering at 550nm is 83%, and the transmission rate of the colored state is 29%, which makes the film have great application prospect in smart windows.