High Power Laser Science and Engineering, 2019, 7 (1): 010000e9, Published Online: Feb. 25, 2019  

High damage threshold liquid crystal binary mask for laser beam shaping Download: 532次

Author Affiliations
1 Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
3 University of Chinese Academy of Sciences, Beijing 100049, China
Abstract
In order to improve the damage threshold and enlarge the aperture of a laser beam shaper, photolithographic patterning technology is adopted to design a new type of liquid crystal binary mask. The inherent conductive metal layer of commercial liquid crystal electro-optical spatial light modulators is replaced by azobenzene-based photoalignment layers patterned by noncontact photolithography. Using the azobenzene-based photoalignment layer, a liquid crystal binary mask for beam shaping is fabricated. In addition, the shaping ability, damage threshold, write/erase flexibility and stability of the liquid crystal binary mask are tested. Using a 1 Hz near-IR (1064 nm) laser, the multiple-shot nanosecond damage threshold of the liquid crystal mask is measured to be higher than $15~\text{J}/\text{cm}^{2}$. The damage threshold of the azobenzene-based photoalignment layer is higher than $50~\text{J}/\text{cm}^{2}$ under the same testing conditions.

Gang Xia, Wei Fan, Dajie Huang, He Cheng, Jiangtao Guo, Xiaoqin Wang. High damage threshold liquid crystal binary mask for laser beam shaping[J]. High Power Laser Science and Engineering, 2019, 7(1): 010000e9.

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