为了获取具有宽截止带的 1064 nm激光窄带滤光膜, 本文以含缺陷的一维光子晶体为基础设计了两种不同的结构。模拟分析了缺陷层引入方式、缺陷层光学厚度、缺陷层材料折射率、光子晶体周期数和缺陷层位置等因素对窄通带位置、宽度和强度的影响, 明确了其影响规律。通过优化光子晶体的结构参数优化滤光膜窄通带、拓宽截止带, 设计了截止范围在 200～1500 nm、1064 nm透过率大于 90%的多层结构滤光膜。

In order to obtain a 1064 nm laser narrowband filter with a wide cut-off band, two different structures were designed based on one-dimensional photonic crystals with defects. The effects of the defect layer introduction method, optical thickness, refractive index of the defect layer, number of photonic crystal cycles, and optical position of the defect layer on the position, width, and intensity of the narrow band were analyzed, and the influence rule was clarified. By optimizing the structural parameters of the photonic crystal, the narrow band of the filter film was optimized, and the cut-off band was broadened. A multilayer structure filter film with a cutoff range of 200-1500 nm and a 1064 nm transmittance of more than 90% was designed.