光学技术, 2019, 45 (2): 251, 网络出版: 2019-04-28  

液浮法抛光优化技术

Optimization technology of liquid float polishing
作者单位
西安工业大学 陕西省光学先进制造工程技术研究中心, 陕西 西安 710021
摘要
一种新的光学元件表面抛光工艺-液浮抛光技术, 采用具有剪切增稠效应的非牛顿流体作为抛光液, 流体在抛光区域形成液膜, 实现对工件表面高效、低损伤的加工。以材料去除量以及工件表面粗糙度作为评价指标, 利用正交实验法对K9玻璃抛光过程中的四个关键影响因素: 磨粒质量分数、磨头入口压强、磨头重力、剪切增稠相中分散相的质量分数进行实验分析, 得到一组最优参数组合以及各主要影响因素对抛光效果的影响程度。对于工件表面粗糙度, 采用极差法得出各因素对整个工件的影响程度的主次顺序为(主→次): 二氧化硅质量分数、磨头重力、入口压强、磨粒质量分数, 最佳参数组合为: 磨粒氧化铈质量分数为14%, 入口压强为0.3MPa, 剪切增稠相中分散相二氧化硅质量分数为9%, 磨头重力为34.3kg; 对于材料去除量分布, 经过90min的抛光, 其平均去除量为0.2μm。
Abstract
A new surface polishing process for optical components - liquid float polishing technology, using a non-newtonian fluid with shear thickening effect as a polishing liquid, the fluid forms a liquid film in the polishing area, and achieves high efficiency and low damage to the surface of the workpiece in the polishing area. Processing. Taking the material removal amount and the surface roughness of the workpiece as evaluation indexes, the influence of four key parameters, abrasive grain mass fraction, grinding head inlet pressure, grinding head gravity, and shear thickening on the liquid float polishing process of K9 glass were analyzed by orthogonal experiment method, and a set of optimal parameter combinations and the influence degree of each main influencing factor on the polishing effect were obtained.The mass fraction of the dispersed phase in the phase was analyzed experimentally, and a set of optimal parameter combinations and the influence degree of each main influencing factor on the polishing effect were obtained. For the surface roughness of the workpiece, the order of influence of each factor on the whole workpiece is determined by the range method (main→time): silica mass fraction, grinding head gravity, inlet pressure, abrasive grain mass fraction, most the combination of good parameters is: the mass fraction of abrasive yttrium oxide is 14%, the inlet pressure is 0.3MPa, the mass fraction of dispersed phase silica in the shear thickening phase is 9%, the gravity of the grinding head is 34.3kg; After 90 minutes of polishing, the average removal was 0.2μm.

弥谦, 秦琳, 李宏, 郭忠达. 液浮法抛光优化技术[J]. 光学技术, 2019, 45(2): 251. MI Qian, QIN Lin, LI Hong, GUO Zhongda. Optimization technology of liquid float polishing[J]. Optical Technique, 2019, 45(2): 251.

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