针对钛宝石晶体表面低损伤加工进行了系统研究, 在CCOS数控小磨头抛光机上进行了正交实验, 选用不同的抛光液对钛宝石进行化学机械抛光, 有效去除精磨阶段的亚表面损伤, 实验证明SiO2硅溶液作为磨料的抛光效果好, 适合作为钛宝石加工的抛光液。研究了抛光盘种类、抛光盘压力、抛光盘速度、硅溶胶稀释浓度这四个因素和钛宝石晶体表面粗糙度和表面疵病的关系, 并获得钛宝石低缺陷加工过程中工艺参数的影响规律。按照优化后的工艺参数进行实验, 获得了低缺陷、高精度的钛宝石表面。运用灰色关联分析法对抛光参数进行优化, 在最佳加工工艺组合条件下, 得到钛宝石表面粗糙度为0.262 nm, 表面疵病率为1.4×10-3 mm-1。

A systematic study on the low damage processing of titanium gemstone crystal surface was carried out. The orthogonal experiment was carried out on the CCOS numerical control small grinding head polishing machine. Different polishing liquids were used to chemically polish the titanium gemstone to effectively remove the subsurface damage during the fine grinding stage. The experiment proves that the SiO2 silicon solution has good polishing effect as an abrasive, and is suitable as a polishing liquid for processing titanium gemstone. The four factors of polishing disc type, polishing disc pressure, polishing disc speed and silica sol dilution concentration and the relationship between surface roughness and surface rickets of titanium gemstone crystal were studied, and the influence of process parameters on the process of low-defect processing of titanium gemstone was obtained. Experiments were carried out according to the optimized process parameters, and a low-defect, high-precision titanium gemstone surface was obtained. The method of grayscale correlation was employed to optimize polishing parameters. After optimization, the system was under the condition of the best combination of processing technique. Finally, a well processed titanium gemstone crystal is obtained, the surface of which possesses a roughness of 0.262 nm and the surface defect rate of the polished crystal is 1.4×10-3 mm-1.