电阻阵列红外仿真技术至今已发展为一项较为成熟的红外成像仿真方法，不仅像元规模越来越大，制造工艺水平也越来越高。尤其是国外，已研制出大规模商用电阻阵列器件，并在众多**系统研制过程中得到了应用；国内在该方面同样取得了较大的进步，但是在传统的非均匀测试方法上国内研究还存在一些遗留问题未得到很好的解决。如实验中出现的莫尔条纹、边缘效应、映射与对准等相关难题很少有研究者提出详尽可行的处理措施。本文针对莫尔条纹和边缘效应问题，提出了一种基于点扩散函数估计的迭代非均匀性测试方法，实现了条纹干扰和边缘效应的去除。此外，本文对于映射比大于 1:1的情况进行了仿真验证，对比了不同映射比和不同非均匀程度对校正效果的影响，给出了进行下一步实验的理论基础。

The infrared simulation technology of resistance array has been developed into an established infrared imaging simulation method, which not only has a larger scale but also employs a higher level of manufacturing technology. Large-scale commercial resistor array devices have been developed and applied in the development of several weapon systems, especially in foreign countries. Domestically, considerable progress has been made in this aspect, but some legacy issues related to research on traditional nonuniformity testing methods have not been well resolved. For example, Moiré fringes, edge effects, mapping, and alignment problems appear in experiments, and few researchers have proposed detailed and feasible treatment measures. In this study, an iterative nonuniformity test method based on point spread function estimation is proposed for solving the problems of Moiré fringes and edge effects. In addition, the simulation verification of the mapping ratio exceeding 1:1 is carried out. The effects of different mapping ratios and nonuniformities on the correction effect are compared, and the theoretical basis for the next experiment in this study is given.