动态信息

Latest Article: Optical design in high density and high capacity multi-layer data storage system

发布:foc2010阅读:1733时间:2014-11-28 17:00:32
Date: 04 Nov 2014

Optical design in high density and high capacity multi-layer data storage system

 

Abstract

Fundamental requirements for optical system design for volume recording system is identified. Anastigmatic objective lens design is required for conventional page-based system, whereas for multi-layer volume recording systems, an Aplanatic and zoom optical design is needed with an afocal sub-optical system including a high numerical aperture (NA) objective element. An NA 0.4 and four element design is feasible by only using off-the-shelf components. Recording depth ranges of 0.4 mm for wavelength 532 nm and 0.2 mm for 405 nm. The design demonstrates sufficiently small as-built wavefront error, less than 0.1 waves while implementing focusing and tracking capabilities to the design.

Yuzuru Takashima is an Associate Professor at College of Optical Sciences of University of Arizona and has been on the faculty since 2011. He teaches one of the core courses: Lens Design for undergraduates and Optical Design for Multi-scale Photonic System for graduate students. Prior to joining to the University of Arizona, he was employed as a research staff by Stanford University, where he has been actively involved in the field of novel optical system design and engineering, particularly for high density page-based and bit-based holographic data storage systems and Nano-photonic electron beam generators. He was employed as an optical engineer at Toshiba Corporation in Japan, where he conducted research and development of ultra-precision manufacturing of optical components and products. He received his B.S. degree in Physics from Kyoto University (1990) and M.S. (2004) and Ph.D. degrees in Electrical Engineering from Stanford University in 2007. His current research includes X-ray optical system design, environmentally robust holographic data storage system, maskbased and mask-less hybrid lithography for 3D optical interconnects, novel alignment process for lithography, ultra-thin form factor head worn display, and environmentally robust free space quantum optical communication system.
> 免责声明
网站内容来源于互联网、原创,由网络编辑负责审查,目的在于传递信息,提供专业服务,不代表本网站及新媒体平台赞同其观点和对其真实性负责。如对文、图等版权问题存在异议的,请于20个工作日内与我们取得联系,我们将协调给予处理(按照法规支付稿费或删除),联系方式:021-69918579。网站及新媒体平台将加强监控与审核,一旦发现违反规定的内容,按国家法规处理,处理时间不超过24小时。 最终解释权归《中国激光》杂志社所有。

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!