运用等效媒质理论对亚波长结构的抗反射表面进行了分析,设计出了一种抗反射表面结构,并利用二元光学制作工艺技术,对这种表面进行了实验制备.测试结果表明,这种表面结构就像单层抗反射膜一样,具有很好的增透效果,表面结构的等效折射率相当于镀层材料折射率,而刻蚀深度则相当于镀层的四分之一波长厚度.

On the basis of the effective medium theory (EMT), both one dimensional and two dimensional periodic structures of antireflection surface are investigated and anlyzed. The 2 D relief structure pattems for antireflection are designed and fabricated on silicon wafers by binary optical processing methods. This 2 D structure can be used as an alternative to thin film coatings to enhance transmission at the boundary between two different media.