半导体光催化技术具有低能耗和环境友好等优点, 在众多氮氧化物去除技术中具有较大的发展潜力。本研究在室温下成功制备了碳酸氧铋(Bi₂O₂CO₃, BOC)/聚吡咯(PPy)光催化剂, 并在可见光下对一氧化氮(NO)进行光催化氧化去除。可见光催化NO氧化性能测试结果表明, BOC复合PPy之后, 其NO去除率从9.4%提高到20.4%, 毒副产物NO₂的生成率从2%降到接近零。这是因为在BOC和PPy界面氢键作用下, 在BOC和PPy界面形成了氧空位。光电流和交流阻抗测试表明氧空位的形成改善了BOC光生载流子分离和迁移过程, 从而提高其光催化活性。此外, BOC/PPy光催化氧化NO机理分析表明, 氧空位促进O₂生成更多的·O₂^-, 进而与·OH共同作用, 提高BOC的NO氧化反应活性和安全性。

Photocatalysis technology possesses great potential in the field of oxidation of nitrogen oxides due to the low energy costs and little secondary pollution. Bismuth carbonate (Bi₂O₂CO₃, BOC)/polypyrrole (PPy) was prepared at room temperature to remove NO under visible light irradiation. After being decorated with PPy, the NO removal efficiency of BOC is enhanced from 9.4% to 20.4% while the generation of NO₂ is reduced from 2% to approximately zero, which are attributed to the oxygen vacancy formed at the interface between BOC and PPy via interfacial hydrogen bonding. Photocurrent and electrochemical impedance spectra indicate that oxygen vacancies promote the separation and migration of photo-induced electrons and holes over BOC, hence improve its photocatalytic activity. Furthermore, the presence of oxygen vacancy promotes the formation of more ·O₂^-, and then improve the NO oxidation activity and safety of BOC together with ·OH.