红外技术, 2019, 41 (10): 895, 网络出版: 2019-12-05  

TiO2薄膜基底上制作多碱光电阴极的探索研究

Analysis of Multi Alkali Photocathode Deposition on TiO2 Film
作者单位
1 北方夜视技术股份有限公司, 云南昆明 650217
2 微光夜视技术重点实验室, 陕西西安 710065
摘要
在 TiO2薄膜基底上制作多碱光电阴极, 发现多碱光电阴极制作工艺无法正常进行, 多碱光电阴极的颜色为暗黑色, 并且阴极灵敏度非常低, 而正常的多碱光电阴极应为红褐色。其中 TiO2薄膜基底利用原子层沉积(ALD)工艺制备在玻璃窗上, 并且具有锐钛矿晶体结构。X射线衍射仪(XRD)分析发现, 制作多碱阴极后的 TiO2薄膜样品锐钛矿衍射峰基本消失, 另外 X射线光电子能谱(XPS)分析发现该 TiO2薄膜样品不同深度均存在 Na元素, 由此表明是 Na元素渗透到 TiO2薄膜中, 破坏了薄膜的晶体结构, 并且导致多碱光电阴极灵敏度非常低。为此提出了一种在制作多碱光电阴极之前, 在 TiO2薄膜上利用 ALD工艺制作一层 Al2O3钝化膜的方法。经过实验验证, 证实该方法可以有效避免 Na元素渗透到 TiO2薄膜, 同时多碱光电阴极制作过程可正常进行, 多碱光电阴极的颜色为红褐色, 阴极灵敏度超过 800 .A/lm。这为将来深入研究采用 TiO2薄膜作为多碱光电阴极的减反膜打下了基础。
Abstract
In this study, experiments involving the deposition of a multi alkali photocathode on a TiO2 film were conducted. However, the manufacturing process of photocathode deposition did not proceed smoothly during this experiment. Furthermore, the photocathode was black in color (whereas it should be rufous under normal conditions) and its sensitivity was very low. In this experiment, a TiO2 film with anatase structure was deposited on a glass window by the atomic layer deposition (ALD) method, and the film was subsequently analyzed. The analysis results of X-ray diffraction (XRD) indicated that the diffraction peak of the anatase almost disappeared. In addition, the analysis results of X-ray photoelectron spectra (XPS) indicated that Na permeated into the TiO2 film. These results prove that the crystal structure of the TiO2 film was destroyed by Na permeation, causing very low sensitivity of the photocathode. Thus, an Al2O3 passive film deposited by the ALD method is proposed to address the Na permeation problem. Another experiment, in which a multi alkali photocathode was deposited on the TiO2 film with an Al2O3passive film, proved that the Na permeation is effectively prevented by the Al2O3 passive film. Importantly, the manufacturing process of photocathode deposition proceeded smoothly during the second experiment, the color of the photocathode was rufous, and the sensitivity of the photocathode was higher than 800 μA/lm. These experiments form the basis of research on employing TiO2 films as antireflection films of multi alkali photocathodes in the future.
参考文献

[1] 李晓峰, 张云昆,,许有毅, 等. 多碱碱光电阴极光电发发射过程研究[J]. 红 外技术, 2012, 344(8): 435-440. LI Xiaofeng, ZHHANG Yunkun, XUU Youyi, et al. Stuudy on photoemisssion process of multi-alkali cathode[JJ]. Infrared Technnology, 2012, 34(8): 435-440.

[2] 李晓峰, 杨文波波, 王俊, 等. 用光光致荧光研究多碱碱阴极光电发射机机理 [J].光子学报 , 22012, 41(12): 14355-1440. LI Xiaofeng, YYANG Wenbo, WANG Jun, ett al. Photoemisssion mechanism of mmulti-alkali photoccathode by photoluuminescence[J]. AActa Photonica Sinicaa, 2012, 41(12): 14435-1440.

[3] 常本康. 多碱阴阴极光学监控原 理研究[J].真空 14(1): 41-46. CHANG Benkanng. A study of suurvey and control principles on opttical information of multi-alkali phootocathode[J]. Vaacuum Science aand Technology (CHIINA), 1994, 14(1): 41-46.

[4] Beguchev V P, SShefova I A, Mussatov A L. Opticaal and photo-emisssive properties of mmultialkali photo-ccathode[J]. APPLL. Phys., 1993,26: 1499-1502.

[5] 常本康 . 碱金属锑锑化物阴极氧敏化化机理的探讨 [J]. 云光技术 , 1984 (4): 24-27.CHANG Benkanng. Research on thhe oxygen sensitizzation of alkali mmetal antimonide cathoode surfaces[J]. YUUNGUANG JISHUU, 1984(4): 24-27.

[6] 常本康. 多碱阴极极表层浅氧敏化初初探[J].应用光学学, 1985(4): 16-21. CHANG Benkanng. A preliminaryy study on the oxxygen sensitizationn of multi-alkaline caathode surfaces[J]. Journal of Appllied Optics, 1985(4): 16-21.

[7] 常本康, 刘元震震, 果玉忱 . 半透明明多碱阴极浅氧敏敏化研究 [J].南京京理工大学学报, 19990(4): 29-33.CHANG Benkang, LIU Yuanzhen, GUO Yuchen. Investigation of superficially oxidized semitransparent multialkali photocathode[J]. Journal of Nanjing University of Science and Technology, 1990(4): 29-33.

[8] 赵恒, 常乐, 李廷涛, 等. 多碱光电阴极激活技术研究 [J].红外技术 , 2018, 40(7): 695-700. ZHAO Heng, CHANG Le, LI Tingtao, et al. Study on Cs-O activation technology of multi-alkali photocathode[J]. Infrared Technology, 2018, 40(7): 695-700.

[9] 李晓峰, 李燕红 , 石峰, 等. Na2KSb与 GaAs光电阴极比较研究 [J].红外技术, 2013, 35(3): 173-179.LI Xiaofeng, LI Yanhong, SHI Feng, et al. Study on the difference between GaAs cathode and Na2KSb cathode[J]. Infrared Technology, 2013, 35(3): 173-179.

[10] 李丹, 何愿华 , 柳清菊. TiO2薄膜光学性质研究[J].大学物理 , 2005, 24(7): 36. LI Dan, HE Yuanhua, LIU Qingju. Study on optical properties of TiO2 film[J]. College Physics, 2005, 24(7): 36

[11] 赵宝星, 周继承 , 荣林艳 , 等. 二氧化钛太阳能电池减反膜结构和光学特性[J].中南大学学报 , 2011, 42(7): 2147-2151. ZHAO Baoxing, ZHOU Jicheng, RONG Linyan, et al. Structure and optical properties of titanium dioxide antireflection thin films for solar cell[J]. Journal of Central South University: Science and Technology, 2011, 42(7): 2147-2151.

[12] 张王乐, 冯昊. 原子层沉积制备纳米 TiO2薄膜研究进展 [J].化工新型材料, 2016, 44(9): 28-32. ZHANG Wangle, FENG Hao. Research progress of TiO2 thin film by atomic layer deposition[J]. New Chemical Materials, 2016, 44(9): 28-32.

[13] 于秋明, 曹良良 , 陈燕, 等. 原子层沉积低温制备高取向锐钛矿 TiO2薄膜[J].真空科学与技术学报 , 2016, 36(5): 510-514. SHE Qiuming, CAO Liangliang, CHEN Yan, et al. Synthesis and characterization of highly oriented anatase-phased TiO2 thin film by atomic layer deposition[J]. Chinese Journal of Vacuum Science and Technology, 2016, 36(5): 510-514.

[14] Chiappim W, Testoni G E, Moraes R S, et al. Structural, morphological, and optical properties of TiO2 thin film grown by atomic layer deposition on fluorine doped tin oxide conductive glass[J]. Vacuum, 2016, 123: 91-102.

[15] Hussin R, Choy K L, Hou X H. Deposited TiO2 thin film by atomic layer deposition(ALD) for optical properties[J]. ARPN Journal of Engineering and Applied Sciences, 2016, 11(12): 7529-7533.

[16] Hussin R, Choy K L, HOU X H. The effect of substrate on TiO2 thin film by atomic layer deposition (ALD)[J]. Advanced Materials Research, 2015, 1087(1): 147-151.

[17] Szindle M, Szindle M M, Borylo P, et al. Structure and optical properties of TiO2 thin film deposited by ALD method[J]. Open Physics, 2017, 15(1): 1067-1071.

[18] XU Y, Lotfabad E M, WANG H, et al. Nanocrystalline anatase TiO2: a new anode material for rechargeable sodium ion batteries[J]. Chemical Communications, 2013, 49(79): 8973-8975.

[19] 卢红亮 , 徐敏, 丁士进, 等. 原子层淀积 Al2O3薄膜的热稳定性研究 [J].无机材料学报 , 2006, 21(5): 1217-1222. LU Hongliang, XU Min, DING Shijin, et al. Thermal stability of atomic layer deposition Al2O3 thin films[J]. Journal of Inorganic Materials, 2006, 21(5): 1217-1222.

[20] 何俊鹏 , 章岳光 , 沈伟东 , 等. 原子层沉积制备 Al2O3薄膜的光学性能研究[J].光学学报 , 2010, 30(1): 277-282. HE Junpeng, ZHANG Yueguang, SHEN Weidong, et al. Optical properties of Al2O3 thin films fabricated by atomic layer deposition[J]. Acta Photonica Sinica, 2010, 30(1): 277-282.

赵伟林, 赵恒, 曾进能, 赵学峰, 常乐, 李廷涛, 李晓峰. TiO2薄膜基底上制作多碱光电阴极的探索研究[J]. 红外技术, 2019, 41(10): 895. ZHAO Weilin, ZHAO Heng, ZENG Jinneng, ZHAO Xuefeng, CHANG Le, LI Tingtao, LI Xiaofeng. Analysis of Multi Alkali Photocathode Deposition on TiO2 Film[J]. Infrared Technology, 2019, 41(10): 895.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!