半导体光电, 2018, 39 (2): 216, 网络出版: 2018-05-29
ICP刻蚀对光刻胶掩模及刻蚀图形侧壁的影响
Effect of ICP Etching on the Photoresist Mask and the Sidewall of the Etching Figure
引用该论文
李雅飞, 李晓良, 马英杰, 陈洁珺, 徐飞, 顾溢. ICP刻蚀对光刻胶掩模及刻蚀图形侧壁的影响[J]. 半导体光电, 2018, 39(2): 216.
LI Yafei, LI Xiaoliang, MA Yingjie, CHEN Jiejun, XU Fei, GU Yi. Effect of ICP Etching on the Photoresist Mask and the Sidewall of the Etching Figure[J]. Semiconductor Optoelectronics, 2018, 39(2): 216.
李雅飞, 李晓良, 马英杰, 陈洁珺, 徐飞, 顾溢. ICP刻蚀对光刻胶掩模及刻蚀图形侧壁的影响[J]. 半导体光电, 2018, 39(2): 216. LI Yafei, LI Xiaoliang, MA Yingjie, CHEN Jiejun, XU Fei, GU Yi. Effect of ICP Etching on the Photoresist Mask and the Sidewall of the Etching Figure[J]. Semiconductor Optoelectronics, 2018, 39(2): 216.