Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition Download: 805次
[1] R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, and M. R. Kozlowski, Appl. Opt. 32, 5567 (1993).
[2] D. Reicher, P. Black, and K. Jungling, Appl. Opt. 39, 1589 (2000).
[3] M. Alvisi, F. De Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto, and S. Scaglione, Thin Solid Films 396, 44 (2001).
[4] B. Andre, L. Poupinet, and G. Ravel, J. Vac. Sci. Technol. A 18, 2372 (2000).
[5] M. Gilo and N. Croitoru, Thin Sold Films 350, 203 (1999).
[6] M. Alvisi, M. Di Giulio, S. G. Marrone, M. R. Perrone, and M. L. Protopapa, Thin Sold Films 358, 250 (2000).
[7] Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surface Sci. 210, 353 (2003).
[8] H. Y. Hu, Z. X. Fan, and F. Luo, Appl. Opt. 40, 1950 (2001).
[9] J. P. Hu, P. Ma, Q. Xu, and W. Li, Chin. Opt. Lett. 1, 340 (2003).
[10] H. Y. Hu, Z. X. Fan, and Y. Liu, Chin. J. Lasers (in Chinese) 26, 489 (1999).
Dawei Zhang, Shuhai Fan, Weidong Gao, Hongbo He, Yingjian Wang, Jianda Shao, Zhengxiu Fan, Haojie Sun. Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition[J]. Chinese Optics Letters, 2004, 2(5): 05305.