利用旋转移相技术的几何相位调控方法，提出一种基于传输相位差概念的波束扫描高功率微波反射阵列天线。电磁仿真结果表明，所设计的三叉戟形反射阵列天线单元工作于9.5～10.5 GHz，在0～40°入射角度下具有360°范围内的线性相位调控能力，真空条件下的功率容量达到1.11 GW。采用该单元设计了半径为200 mm的圆形口径反射阵列天线，并使用全波仿真软件进行验证，利用口径相位分布的可重构特性，所设计的反射阵列天线可以实现±40°范围内的波束扫描。在10 GHz时，波束扫描过程中的增益下降小于1.7 dB，最大增益达到31.1 dBi，对应口径效率为73.42%，最低口径效率超过50%，副瓣电平和轴比始终低于−18.7 dB和1.6 dB。

传统的透射式空馈阵列存在功率容量低的缺点，不能直接应用于高功率微波领域。现有的高功率空馈阵列布局不够灵活，波束扫描速度较慢，不能充分发挥空馈阵列在系统集成方面的优势。提出并设计了一种新型的采用空间馈电的螺旋辐射单元，并构建了一种透射式空馈螺旋阵列天线，通过控制单个螺旋旋转可以实现二维波束扫描，在设计上更加灵活，可根据实际应用需求调整阵列布局，符合高功率微波天线紧凑化、模块化的发展趋势。仿真设计了包含324个单元的透镜阵列，数值模拟结果表明，单元反射系数S₁₁≤−20 dB，功率容量0.35 MW，阵列口径效率0.68，可在±45°范围内扫描，最大增益下降3 dB。

提出了一种新型高功率微波宽带紧耦合偶极子阵列天线。在常规的紧耦合偶极子阵列天线的基础上，该阵列天线通过采用全金属结构设计、天线匹配层和密封层一体化设计以及调节天线结构的手段，获得了宽带高功率性能。仿真结果显示，在0.8～4.0 GHz的范围内，天线未扫描时的驻波比小于2；在16 mm×32 mm单元尺寸内和1个大气压的SF₆气体中，功率容量达到0.12 MW；以该单元天线组成10×10阵列，100个单元总尺寸仅为160 mm×320 mm，在1个大气压的SF₆气体中，功率容量可以达到12 MW，另外，该天线可实现45°的宽角扫描。该阵列天线的提出为实现高功率微波宽带天线的宽频带、大角度扫描、紧凑化、小型化以及低剖面化提供了参考。

设计并制作了一款直径为1.1 mm、频率为31.11 kHz的MEMS压电微镜，用于需要高速扫描且小尺寸的应用场景。该器件所需模态为扭转模态，与其他模态分离情况好，不会出现耦合。实验结果显示，电压为32 V时光学扫描角40.66°，品质因子1 155。改变PZT极性，实验得到了薄膜材料的铁电性质影响。另外，完成了MEMS微镜在0 ℃~100 ℃不同温度下角度的变化实验，偏离不超过±1°。仿真模拟、实验结果和理论计算结果三者拟合情况好，表明该设计的微镜具有较高的可控性和稳定性，为实现高精度扫描提供了有力支持。该MEMS压电微镜在AR/VR等领域中具有潜在的应用前景。

Overview: Two-photon lithography (TPL) has been a research hotspot in 3D micro/nano writing technology due to its characteristics of high resolution, low thermal influence, a wide range of processed materials, low environmental requirements, and 3D processing capability. It has shown unique advantages in the fields of life science, material engineering, micro/nano optics, microfluidic, micro machinery, and so on. This paper summarizes the research works done by researchers on different writing methods to improve TPL processing efficiency. Single-beam writing is the main method for TPL, which mainly depends on the speed of the scanning device. Single-beam writing has the advantages of simple system and high-quality beam, and it is easy to combine various effects to improve writing results. It mainly includes scanning modes based on the translation stage, galvo, polygon laser scanner, and acousto-optic deflector (AOD) (Fig. 2). All these modes have advantages and disadvantages. As for the scanning speed comparison, polygon laser scanner and AOD have relatively faster writing rates (faster than m/s). Multi-foci parallel lithography can obviously promote efficiency, elevating the speed by dozens or even hundreds of thousands of times, mainly based on spatial light modulator (SLM), digital micromirror device (DMD), microlens array (MLA), diffractive optical elements (DOE), multi-beam interference, and so on (Figs. 3-15). Multi-foci parallel lithography based on SLM is most widely used owing to its high efficiency and ability to flexible and independent control of each single beam, but the refresh rate is still insufficient. DMD has a higher refreshing rate (32 kHz), but the state-of-the-art beam parallelism realized by DMD is severely limited. More parallel beams are further required for improving the processing efficiency. The 2D pattern exposure method based on SLM or DMD can further improve the TPL efficiency with the superiority of generating flexibly designed pattern (Figs. 16-18). However, the 2D projection exposure technology is still difficult to achieve high writing precision, especially the axial resolution. An available method to improve the axial precision is spatially and temporally focusing an ultrafast laser to implement a strong intensity gradient at the spatial focal plane that restricts polymerization within a thin layer. The 3D projection method will be the most efficient writing method in the future, especially in 3D device processing (Figs. 19-20). Researchers used this technique to make hollow tubular and conical helices structures, increasing the processing speed by 600 times. However, the research results show that the current 3D projection can only process simple 3D structures. Further researches on 3D exposure processing of complex structures are expected, which will effectively expand its application in various fields. Authors believe that with the effort of researchers on efficiency improvement gradually, TPL can further highlight its advantages to promote the development of life science, materials engineering, micro-nano optics, and many other fields.

In this paper, a 2D angle amplifier based on peristrophic multiplexed volume Bragg gratings is designed and prepared, in which a calculation method is firstly proposed to optimize the number of channels to a minimum. The induction of peristrophic multiplexing reduces the performance difference in one bulk of the grating, whereas there is no need to deliberately optimize the fabrication process. It is revealed that a discrete 2D angle deflection range of ±30° is obtained and the relative diffraction efficiency of all the grating channels reaches more than 55% with a root-mean-square deviation of less than 3.4% in the same grating. The deviation of the Bragg incidence and exit angles from the expected values is less than 0.07°. It is believed that the proposed 2D angle amplifier has the potential to realize high-performance and large-angle beam steering in high-power laser beam scanning systems.