中国科学院上海光学精密机械研究所 高功率激光物理联合实验室, 上海 201800
以锆酸丙酯[Zr(OPr)4]、正硅酸乙酯(TEOS)为原料, 用溶胶-凝胶(sol-gel)提拉法涂膜, 制备高透过的λ/ 4～λ/ 4型ZrO2/SiO2双层减反膜。该减反膜的表面均匀, 均方根(RMS)粗糙度为1.038 nm, 平均粗糙度(RA)为0.812 nm。制备的双层减反膜具有很好的减反效果, 在石英玻璃基片二面涂膜, 在激光三倍频波长351 nm处透射比达到99.41％, 比未涂膜石英玻璃基片的透射比提高了6.14％;在基频波长1053 nm处透射比达到99.63％, 比未涂膜K9光学玻璃基片的透射比提高了7.67％。膜层具有较高的激光损伤阈值, 在激光波长为1053 nm, 脉冲宽度为1 ns时, 薄膜的激光损伤阈值达到16.8 J/cm2。膜层具有良好的耐擦除性能。
薄膜光学 溶胶-凝胶 双层减反 耐擦除
Author Affiliations
Abstract
中科院上海光学精密机械研究所高功率激光物理国家实验室,上海201800
type of λ/4～λ/2 broadband antireflective coating has been developed by sol-gel dipping method with tetrabutylorthotitanate and tetraethoxysilane (TEOS) as precursors. This antireflective coating possesses smooth and even surface,its average roughness is estimated having the value of RMS (1.201) and RA (0.934),and the specific scratch-resistant is good. Most -OH groups are eliminated at the temperature near 200 ℃. The average transmission of both-coated K9 substrate is increased 6.6% higher than uncoated one in the spectra from 400 nm to 700 nm. The antireflective coating is expected to coat amplifier blastshields of "Sheng-Guang: facility for enhancing the pumping efficiency of amplifiers
薄膜物理学 溶胶-凝胶 宽带增透膜 表面均匀 耐擦除 film physics sol-gel broadband antireflective coatings even surface scratch-resistant Collection Of theses on high power laser and plasma physics
2004, 2(1): 18
中科院上海光学精密机械研究所高功率激光物理国家实验室,上海201800
以钛酸正丁酯[Ti(OBu)4]、正硅酸乙酯(TEOS)为原料,采用溶胶-凝胶(sol-gel)提拉方法在K9光学玻璃基片上镀制得高透过的λ/4～λ/2型宽带增透膜.该增透膜的表面均匀性良好,均方根粗糙度(RMS)为1.201,平均粗糙度(RA)为0.934,具有一定的耐擦除性.经200 ℃热处理,膜层中的OH吸收峰已基本消失,在400～700 nm光谱范围的透过率比基片的平均透过率提高6.6%.为实现大面积涂覆"神光"装置主放大器的防爆隔板玻璃,大幅度提高主放大器的抽运效率奠定基础.
薄膜物理学 溶胶-凝胶 宽带增透膜 表面均匀 耐擦除
