激光技术, 2011, 35 (6): 800, 网络出版: 2011-11-09   

缓冲气压对CO2激光Al靶等离子体参量的影响

Analysis of the properties of CO2 laser-induced aluminum plasma at different ambient pressures
作者单位
1 华中科技大学 光电子科学与工程学院 武汉光电国家实验室,武汉 430074
2 武汉工程大学 理学院,武汉 430074
摘要
为了研究缓冲气压对激光等离子体参量的影响,利用CO2激光烧蚀Al靶产生等离子体,缓冲气压变化范围为10-4Pa~2 103Pa,激光脉冲能量为180mJ/脉冲,在局域热平衡和光学薄等离子体假设下,采用发射光谱法计算了等离子体的电子温度和电子密度,并研究了缓冲气压对这些参量的影响。结果表明,等离子体的电子温度和电子密度分别在1.05eV~2.47eV与1.95 1016cm-3~10.5 1016cm-3范围内,Al等离子体的电子温度随气压的增大而减少;低缓冲气压时,电子密度随气压增大而减小,当气压达到600Pa时,激光脉冲会击穿空气形成等离子体,电子密度又开始上升,当气压超过3000Pa时,空气等离子体会屏蔽激光脉冲能量,使到达靶面的激光能量急剧下降,Al原子的特征谱线也随之减弱而几乎消失。这一结果对理解缓冲气压对激光与物质相互作用过程的影响是有帮助的。
Abstract
In order to study the properties of laser-induced plasma at different ambient pressures, emission spectroscopy was studied on aluminum plasma generated by CO2 laser with energy of 180mJ/pulse at different air ambient pressures. The dependency of plasma temperature and density on ambient pressures were estimated from the analysis of spectral data by assuming the conditions of local thermodynamic equilibrium and optically thin plasma. Electron temperature was measured in the range of 1.05eV~2.47eV, and electron density was measured in the range of 1.95 1016cm-3~10.5 1016cm-3, as the ambient pressure was varied from 10-4Pa to 2 103Pa. The results show that the plasma temperature decreases with the ambient pressures. At first, the electron density decreases with the increase of ambient pressure under low pressure. When the pressure reaches 600Pa, the broken air plasma may interact with Al vapor and the electron density increases with the pressure increasing. For larger ambient pressure up to 3000Pa, the Al emission lines eventually disappear, suggesting that the laser energy is almost screened by the air plasma. The results provide useful guidance to understand the influence of air pressure on laser-matter interaction.

吴涛, 王新兵, 唐建, 饶志明, 王少义. 缓冲气压对CO2激光Al靶等离子体参量的影响[J]. 激光技术, 2011, 35(6): 800. WU Tao, WANG Xin-bing, TANG Jian, RAO Zhi-ming, WANG Shao-yi. Analysis of the properties of CO2 laser-induced aluminum plasma at different ambient pressures[J]. Laser Technology, 2011, 35(6): 800.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!