光电工程, 2018, 45 (4): 170642, 网络出版: 2018-05-29  

基于变压力的CCOS光学研抛技术

Study on the variable pressure CCOS polishing technology
作者单位
1 四川大学制造科学与工程学院,四川 成都 610065
2 中国科学院光电技术研究所,四川 成都 610209
引用该论文

叶枫菲, 余德平, 万勇建, 刘海涛, 赵洪深. 基于变压力的CCOS光学研抛技术[J]. 光电工程, 2018, 45(4): 170642.

Ye Fengfei, Yu Deping, Wan Yongjian, Liu Haitao, Zhao Hongshen. Study on the variable pressure CCOS polishing technology[J]. Opto-Electronic Engineering, 2018, 45(4): 170642.

参考文献

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叶枫菲, 余德平, 万勇建, 刘海涛, 赵洪深. 基于变压力的CCOS光学研抛技术[J]. 光电工程, 2018, 45(4): 170642. Ye Fengfei, Yu Deping, Wan Yongjian, Liu Haitao, Zhao Hongshen. Study on the variable pressure CCOS polishing technology[J]. Opto-Electronic Engineering, 2018, 45(4): 170642.

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