红外与毫米波学报, 2018, 37 (2): 184, 网络出版: 2018-05-29  

基于标准CMOS工艺线性APD倍增区的优化仿真

Simulation of the multiplication zone for linear APD based on standard CMOS process
作者单位
1 中国科学院上海技术物理研究所 红外成像材料与器件重点实验室,上海 200083
2 中国科学院大学,北京 100049
3 上海科技大学 信息科学与技术学院,上海 201210
引用该论文

鞠国豪, 程正喜, 陈永平, 钟燕平. 基于标准CMOS工艺线性APD倍增区的优化仿真[J]. 红外与毫米波学报, 2018, 37(2): 184.

JU Guo-Hao, CHENG Zheng-Xi, CHEN Yong-Ping, ZHONG Yan-Ping. Simulation of the multiplication zone for linear APD based on standard CMOS process[J]. Journal of Infrared and Millimeter Waves, 2018, 37(2): 184.

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鞠国豪, 程正喜, 陈永平, 钟燕平. 基于标准CMOS工艺线性APD倍增区的优化仿真[J]. 红外与毫米波学报, 2018, 37(2): 184. JU Guo-Hao, CHENG Zheng-Xi, CHEN Yong-Ping, ZHONG Yan-Ping. Simulation of the multiplication zone for linear APD based on standard CMOS process[J]. Journal of Infrared and Millimeter Waves, 2018, 37(2): 184.

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