激光与光电子学进展, 2020, 57 (9): 091801, 网络出版: 2020-05-06
并行STED显微中光学系统对荧光擦除图案的影响 
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Effect of Optical System on the Fluorescence Depletion Pattern in the Parallelized STED Microscopy
图 & 表
图 1. 并行STED显微成像系统的简化理想光学系统模型
Fig. 1. Parallelized STED simplified perfect optical system model of microscopic imaging system
图 2. 理论计算结果。(a)并行荧光擦除图案周期的导数dP/du随物方倾斜角u增大的变化曲线;(b)并行荧光擦除图案周期P及最佳辅助物镜焦距foptimum随物方倾斜角u增大的变化曲线
Fig. 2. Theoretical calculation results. (a)Derived function of parallelized fluorescence depletion patterns periodicity dP/du with inclination angle of object space u; (b) parallelized fluorescence depletion patterns periodicity P and the optimum tube lens focal length foptimum with inclination angle of object space u
图 3. 并行荧光擦除图案的仿真结果。(a)水平偏振损耗光束在聚焦区域产生的干涉图样;(b)竖直偏振损耗光束在聚焦区域产生的干涉图样;(c)所有损耗光束在聚焦区域产生的并行荧光擦除图案
Fig. 3. Simulation results of parallelized fluorescence depletion patterns. (a) Interference patterns produced by horizontal polarization STED beams in focus; (b)interference patterns produced by vertical polarization STED beams in focus; (c) parallelized fluorescence depletion patterns produced by all STED beams in focus
张硕晨, 冯继宏. 并行STED显微中光学系统对荧光擦除图案的影响[J]. 激光与光电子学进展, 2020, 57(9): 091801. Shuochen Zhang, Jihong Feng. Effect of Optical System on the Fluorescence Depletion Pattern in the Parallelized STED Microscopy[J]. Laser & Optoelectronics Progress, 2020, 57(9): 091801.
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