[1] Levinson HJ. Principles of lithography[M]. Washington: SPIE Press, 2010: 162- 200.

    Levinson HJ. Principles of lithography[M]. Washington: SPIE Press, 2010: 162- 200.

[2] Mack C A. Analytical expression for impact of linewidth roughness on critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014, 13(2): 020501.

    Mack C A. Analytical expression for impact of linewidth roughness on critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014, 13(2): 020501.

[3] Avizemer D, Sharoni O, Oshemkov S, et al. Critical dimension control using ultra short laser for improving wafer critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2015, 14(3): 033510.

    Avizemer D, Sharoni O, Oshemkov S, et al. Critical dimension control using ultra short laser for improving wafer critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2015, 14(3): 033510.

[4] Guo L P, Wang X Z, Huang H J. Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography[J]. Chinese Optics Letters, 2006, 4(4): 237-239.

    Guo L P, Wang X Z, Huang H J. Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography[J]. Chinese Optics Letters, 2006, 4(4): 237-239.

[5] 郭立萍, 黄惠杰, 王向朝. 积分棒在步进扫描投影光刻系统中的应用[J]. 光子学报, 2006, 35(7): 981-985.

    郭立萍, 黄惠杰, 王向朝. 积分棒在步进扫描投影光刻系统中的应用[J]. 光子学报, 2006, 35(7): 981-985.

    Guo L P, Huang H J, Wang X Z. Study of integrator rod in step and scan lithography[J]. Acta Photonica Sinica, 2006, 35(7): 981-985.

    Guo L P, Huang H J, Wang X Z. Study of integrator rod in step and scan lithography[J]. Acta Photonica Sinica, 2006, 35(7): 981-985.

[6] Dimas C F, Read S, Kuta J J. Integrating rod homogeneity as a function of cross-sectional shape[J]. Proceedings of SPIE, 2002, 4768: 82-92.

    Dimas C F, Read S, Kuta J J. Integrating rod homogeneity as a function of cross-sectional shape[J]. Proceedings of SPIE, 2002, 4768: 82-92.

[7] Arai J, Kawai H, Okano F. Microlens arrays for integral imaging system[J]. Applied Optics, 2006, 45(36): 9066-9078.

    Arai J, Kawai H, Okano F. Microlens arrays for integral imaging system[J]. Applied Optics, 2006, 45(36): 9066-9078.

[8] Zimmermann M, Lindlein N, Voelkel R, et al. Microlens laser beam homogenizer: from theory to application[J]. Proceedings of SPIE, 2007, 6663: 666302.

    Zimmermann M, Lindlein N, Voelkel R, et al. Microlens laser beam homogenizer: from theory to application[J]. Proceedings of SPIE, 2007, 6663: 666302.

[9] Feng Z, Huang L, Jin G, et al. Designing double freeform optical surfaces for controlling both irradiance and wavefront[J]. Optics Express, 2013, 21(23): 28693-28701.

    Feng Z, Huang L, Jin G, et al. Designing double freeform optical surfaces for controlling both irradiance and wavefront[J]. Optics Express, 2013, 21(23): 28693-28701.

[10] Jin Y, Hassan A, Jiang Y J. Freeform microlens array homogenizer for excimer laser[J]. Optics Express, 2016, 24(22): 24846-24858.

    Jin Y, Hassan A, Jiang Y J. Freeform microlens array homogenizer for excimer laser[J]. Optics Express, 2016, 24(22): 24846-24858.

[11] Brandt RJ, Calif P. Uniformity filter: US6076942[P/OL]. ( 2000-06-20)[2018-02-27]. https://www.bing.com/search?q=US6076942.

    Brandt RJ, Calif P. Uniformity filter: US6076942[P/OL]. ( 2000-06-20)[2018-02-27]. https://www.bing.com/search?q=US6076942.

[12] Stroeldraijer J MD, Ten C J W R, Fey F HA, et al. Lithography apparatus: EP0952491A3[P/OL]. ( 2001-05-09) [2018-02-27]. https://www.bing.com/search?q=EP0952491A3.

    Stroeldraijer J MD, Ten C J W R, Fey F HA, et al. Lithography apparatus: EP0952491A3[P/OL]. ( 2001-05-09) [2018-02-27]. https://www.bing.com/search?q=EP0952491A3.

[13] Cao S W. A illumination uniformity compensation device and lithography machine with the device: CN201010124083.7[P].2010-08-18.

    Cao S W. A illumination uniformity compensation device and lithography machine with the device: CN201010124083.7[P].2010-08-18.

    曹昇炜. 一种照明均匀性补偿装置及具有该装置的光刻机: CN201010124083.7[P].2010-08-18.

    曹昇炜. 一种照明均匀性补偿装置及具有该装置的光刻机: CN201010124083.7[P].2010-08-18.

[14] Cheng W L, Zhang Y B, Zhu J, et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Optics Communications, 2017, 392: 77-85.

    Cheng W L, Zhang Y B, Zhu J, et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Optics Communications, 2017, 392: 77-85.

[15] 张巍, 巩岩. 投影光刻离轴照明衍射光学元件的矢量分析[J]. 光学学报, 2011, 31(10): 1005002.

    张巍, 巩岩. 投影光刻离轴照明衍射光学元件的矢量分析[J]. 光学学报, 2011, 31(10): 1005002.

    Zhang W, Gong Y. Vector analysis of diffractive optical elements for off-axis illumination of projection lithography system[J]. Acta Optica Sinica, 2011, 31(10): 1005002.

    Zhang W, Gong Y. Vector analysis of diffractive optical elements for off-axis illumination of projection lithography system[J]. Acta Optica Sinica, 2011, 31(10): 1005002.

[16] Tounai K, Tanabe H, Nozue H, et al. Resolution improvement with annular illumination[J]. Proceedings of SPIE, 1993, 1927: 137-157.

    Tounai K, Tanabe H, Nozue H, et al. Resolution improvement with annular illumination[J]. Proceedings of SPIE, 1993, 1927: 137-157.

[17] Wu R M, Li H F, Zheng Z R, et al. Freeform lens arrays for off-axis illumination in an optical lithography system[J]. Applied Optics, 2011, 50(5): 725-732.

    Wu R M, Li H F, Zheng Z R, et al. Freeform lens arrays for off-axis illumination in an optical lithography system[J]. Applied Optics, 2011, 50(5): 725-732.

[18] 吕彦飞, 董渊, 李述涛, 等. 一种用于减少相位突变点的衍射光学元件改进设计方法[J]. 光学学报, 2012, 32(4): 0505001.

    吕彦飞, 董渊, 李述涛, 等. 一种用于减少相位突变点的衍射光学元件改进设计方法[J]. 光学学报, 2012, 32(4): 0505001.

    Lü Y F, Dong Y, Li S T, et al. Modified algorithm for designing of diffractive optical element to decrease the phase singular spots[J]. Acta Optica Sinica, 2012, 32(4): 0505001.

    Lü Y F, Dong Y, Li S T, et al. Modified algorithm for designing of diffractive optical element to decrease the phase singular spots[J]. Acta Optica Sinica, 2012, 32(4): 0505001.

[19] 胡中华, 杨宝喜, 朱菁, 等. 用于投影光刻机光瞳整形的衍射光学元件设计[J]. 中国激光, 2013, 40(6): 0616001.

    胡中华, 杨宝喜, 朱菁, 等. 用于投影光刻机光瞳整形的衍射光学元件设计[J]. 中国激光, 2013, 40(6): 0616001.

    Hu Z H, Yang B X, Zhu J, et al. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese Journal of Lasers, 2013, 40(6): 0616001.

    Hu Z H, Yang B X, Zhu J, et al. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese Journal of Lasers, 2013, 40(6): 0616001.

[20] 胡中华, 杨宝喜, 朱菁, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9): 0908001.

    胡中华, 杨宝喜, 朱菁, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9): 0908001.

    Hu Z H, Yang B X, Zhu J, et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9): 0908001.

    Hu Z H, Yang B X, Zhu J, et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9): 0908001.