等离子体密度对放电等离子体极紫外光源影响研究
徐强, 赵永蓬, 王骐, 杨永涛. 等离子体密度对放电等离子体极紫外光源影响研究[J]. 光谱学与光谱分析, 2017, 37(8): 2560.
XU Qiang, ZHAO Yong-peng, WANG Qi, YANG Yong-tao. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source[J]. Spectroscopy and Spectral Analysis, 2017, 37(8): 2560.
[1] Hosokai T, Yokoyama T, Zhidkov A, et al. Journal of Applied Physics, 2008, 104(5): 053306.
[2] Sizyuk T, Hassanein A. Physics of Plasmas, 2014, 21(8): 083106.
[3] Akel M, Salo S A, Saboohi S, et al. Vacuum, 2014, 101: 360.
[4] Tao W, Xinbing W, Shaoyi W. Plasma Science & Technology, 2013, 15(5): 435.
[5] Tobin I, Juschkin L, Sidelnikov Y, et al. Applied Physics Letters, 2013, 102(20): 203504.
[6] Xu Q, Zhao Y, Xie Y, et al. The European Physical Journal D, 2014, 68(3): 40.
[7] Benk M, Bergmann K. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2012, 11(2): 021106.
[8] Zuppella P, Reale A, Ritucci A, et al. Plasma Sources Science and Technology, 2009, 18(2): 025014.
[9] Zeng J, Gao C, Yuan J. The European Physical Journal D, 2010, 60(2): 309.
[10] Fahy K, Dunne P, Mckinney L, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3225.
[11] Borisov V M, Eltsov A V, Ivanov A S, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3254.
[12] BWering N. Journal of Applied Physics, 2004, 95(1): 16.
[13] Poirier M, Blenski T, De Gaufridy De Dortan F, et al. Journal of Quantitative Spectroscopy and Radiative Transfer, 2006, 99(1-3): 482.
[14] Gilleron F, Poirier M, Blenski T, et al. Journal of Applied Physics, 2003, 94(3): 2086.
[15] Platonov Y, Rodriguez J, Kriese M, et al. EUV and X-Ray Optics: Synergy between Laboratory and Space Ⅱ, 2011: 80760N.
[16] Xu Q, Zhao Y, Liu Y, et al. The European Physical Journal D, 2013, 67(6): 125.
[17] Krücken T, Bergmann K, Juschkin L, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3213.
[18] Rakowski R, Bartnik A, Fiedorowicz H, et al. Applied Physics B, 2010, 101(4): 773.
徐强, 赵永蓬, 王骐, 杨永涛. 等离子体密度对放电等离子体极紫外光源影响研究[J]. 光谱学与光谱分析, 2017, 37(8): 2560. XU Qiang, ZHAO Yong-peng, WANG Qi, YANG Yong-tao. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source[J]. Spectroscopy and Spectral Analysis, 2017, 37(8): 2560.
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