光电子快报(英文版), 2016, 12 (4): 285, Published Online: Oct. 12, 2017
Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition
Suppl. Mat.
LI Dong-ling, FENG Xiao-fei, WEN Zhi-yu, SHANG Zheng-guo, SHE Yin. Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition[J]. 光电子快报(英文版), 2016, 12(4): 285.