红外与毫米波学报, 2016, 35 (2): 206, 网络出版: 2016-05-11   

利用全固态分子束外延方法在Ge(100)衬底上异质外延GaAs薄膜及相关特性表征

Initial heteroepitaxial growth and characterization of GaAs on Ge(100) by all-solid-source molecular beam epitaxy
作者单位
1 中国人民武装警察部队学院 基础部, 河北 廊坊 065000
2 中国科学院苏州纳米技术与纳米仿生研究所 纳米器件及相关材料研究部, 江苏 苏州 215123
引用该论文

何巍, 陆书龙, 杨辉. 利用全固态分子束外延方法在Ge(100)衬底上异质外延GaAs薄膜及相关特性表征[J]. 红外与毫米波学报, 2016, 35(2): 206.

HE Wei, LU Shu-Long, YANG Hui. Initial heteroepitaxial growth and characterization of GaAs on Ge(100) by all-solid-source molecular beam epitaxy[J]. Journal of Infrared and Millimeter Waves, 2016, 35(2): 206.

参考文献

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何巍, 陆书龙, 杨辉. 利用全固态分子束外延方法在Ge(100)衬底上异质外延GaAs薄膜及相关特性表征[J]. 红外与毫米波学报, 2016, 35(2): 206. HE Wei, LU Shu-Long, YANG Hui. Initial heteroepitaxial growth and characterization of GaAs on Ge(100) by all-solid-source molecular beam epitaxy[J]. Journal of Infrared and Millimeter Waves, 2016, 35(2): 206.

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