光学学报, 2017, 37 (2): 0216001, 网络出版: 2017-02-13
反应离子刻蚀制备的多晶黑硅损伤去除与钝化性能研究
Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching
补充材料
金磊, 李玉芳, 沈鸿烈, 蒋晔, 杨汪扬, 杨楠楠, 郑超凡. 反应离子刻蚀制备的多晶黑硅损伤去除与钝化性能研究[J]. 光学学报, 2017, 37(2): 0216001. Jin Lei, Li Yufang, Shen Honglie, Jiang Ye, Yang Wangyang, Yang Nannan, Zheng Chaofan. Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching[J]. Acta Optica Sinica, 2017, 37(2): 0216001.