颗粒污染物是高功率激光装置光学元件损伤的诱因之一,掌握污染物产生规律是解决污染诱致损伤问题的基础。针对本色氧化工艺处理前后的5052铝合金样品,研究了激光辐照样品诱致亚微米和微米尺寸气溶胶颗粒的产生规律,分析了激光能量密度、脉冲数目、激光光斑直径、表面粗糙度等参数对颗粒物数量的影响。结果表明:颗粒物数量和激光光斑面积呈正相关;激光能量密度低于烧蚀阈值时,颗粒物产生于第一个脉冲辐照过程,高于烧蚀阈值时,表面颗粒物数量随着激光能量密度增加而逐渐增加;随着激光脉冲数目的增加,本色氧化5052样品产生颗粒物的数量逐渐增加,而5052样品产生颗粒物的数量变化不明显。两种不同表面工艺样品产生颗粒物的规律存在较大差别;低于烧蚀阈值时,两种样品产生的颗粒物数量相当;在烧蚀阈值附近时,颗粒物数量存在陡增现象;高于烧蚀阈值时,本色氧化5052样品产生的颗粒物数量显著多于5052样品。研究结果为高功率激光装置中铝合金表面处理和洁净控制提供了参考依据。

真空环境下大口径光学元件的装夹采用传统有机物无应力装夹方式会带来有机污染等各种问题。设计了一种大口径平面光学元件的夹具和装夹方案，利用金属结构直接装夹大口径平面光学元件，可在降低金属装夹框表面加工精度和光学元件处于任意倾斜角度等情况下，不产生光学元件装夹应力，同时避免了传统有机物无应力装夹而带来的有机污染。可广泛应用于大口径平面光学元件在光学工程、光学实验装置中的装夹。

It is important to keep away from the ghost reflection point for the arrangement design of final optics assembly (FOA) in the high power laser facility. The high power output of the “SG-Ⅱ” upgrading laser, limited target field space and complicated ghost reflection distribution lead to the difficult design of the FOA. By using the ghost image analysis software designed by ourselves, we analyzed the ghost reflection distribution of the FOA. Then, the arrangement of two types of designs for the FOA was optimized. According to the characteristics of “SG-Ⅱ” upgrading laser, we obtained the design for the FOA, which can satisfy the system requirement exactly.

设计高功率激光装置靶场终端光学组件(FOA)时考虑的重要因素是鬼像对光学元件的破坏。由于神光Ⅱ升级装置(SG-Ⅱ-U)的输出能量高、靶场空间小、鬼像分布情况复杂,导致了终端光学组件的设计难度很高。用自主研发的鬼像控制设计软件对神光Ⅱ升级装置靶场终端光学组件排布进行设计,给出了进行鬼像控制设计时需考虑的设计因素,并对比研究了两种靶场终端光学组件设计方案的优缺点,最后结合神光Ⅱ升级装置的特点,优化设计出神光Ⅱ升级装置靶场终端光学组件的最终排布方案。

In order to realize the third harmonic propagating at high-power and irradiating target, a method based on the combination of wedge window and focus lens has been proposed to serve the important function of angularly dispersing the unconverted the fundamental and second harmonic away from the third harmonic target in high power laser facility. Based on the multifunctional and high-power laser system of “Shenguang-Ⅱ” facility, the wedge window is designed. And resulted from the wedge window, the B-integral and the space error between the second harmonic and third harmonic are analyzed. In experiment, the third harmonic propagating at high-power has been improved from 0.7～1 J/cm2 to 2.8 J/cm2, and the space is up to 2.85 mm at the third harmonic target. The method can be used to achieve the third harmonic splitter in high power laser facility.

基于棱镜的色散特性,提出一种楔形窗口与聚焦透镜组合的方式,解决了高功率激光装置三倍频谐波分离所存在的问题,即三倍频的高通量传输和靶面辐照。结合“神光Ⅱ”装置多功能高能激光系统有关参数进行系统设计,确定了楔形窗口参数,并对其所引起的B积分和间距误差进行了分析。通过实验测试,三倍频传输通量由0.7～1 J/cm2提高到2.8 J/cm2,同时靶面三倍频和二倍频分离间距达到2.85 mm,实现了高功率激光装置高通量传输的三倍频谐波分离。

在"神光-Ⅱ"装置上进行先进高能多功能激光束系统(简称第九路)研制工程中,由于在原ICF靶室上又增加了输入"汤姆逊探针光"和"X光背光照明探针光"的锥形真空套筒及其终端光学元件,导致原有靶室结构的变化,可能会引入新的不稳定因素.通过有限元分析方法,建立有限元分析模型,进行优化设计.通过位移传感器测量结果可知,第九路终端光学元件径向窜动所引起的打靶误差最大值为2.110 μm,小于"神光-Ⅱ"靶场终端光学系统的最大允许误差值7.785 μm.

由于群速度失配的影响,飞秒光脉冲在感应到FONPS(级联五阶非线性相移)的同时,将不可避免地发生脉冲畸变。通过理论分析及数值模拟,提出了使级联五阶非线性过程运行在较大相位失配条件下的解决方案,成功地消除了脉冲畸变。并且借助于该过程中倍频效率的提高,有效地补偿由于相位失配量的增大所造成的FONPS的下降,实现飞秒基频光脉冲在感应到大的FONPS的同时无脉冲畸变发生。